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 Zirconium disilicide, ZrSi2 ceramic sputtering target

purity: 99.5%

Shape: Discs, disks, step disk, delta, plate, sheets or made per drawing

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm, if larger size than this, we can do it as Tiles joint by 45 degree or 90 degree

Made sputtering targets method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Zirconium(IV) silicide is an inorganic chemical compound with the chemical formula ZrSi2, consisting of zirconium and silicon atoms. Appearance: Grey odorless powder,

Molar mass: 147.39, density: 4.88g/cm3, Melting point: 1620oC (1790oC), Element: Si: 38.11, Zr: 61.89.

Applications: the raw material made in metal ceramic (cermet), the crucible for made semiconductor thin film coating material

We also supply below Silicide sputtering targets material:

Chromium Silicide , CrSi2 target       

Cobalt Silicide , Co3Si target       

Hafnium Silicide , HfSi2 target       

Molybdenum silicide, MoSi2, Mo5Si3 target       

Nickel Silicide , NiSi target       

Niobium Silicide , Nb5Si3, NbSi2 target       

Tantalum Silicide , Ta5Si3, TaSi2 target       

Titanium silicide, Ti5Si3, TiSi2 target       

Tungsten Silicide , WSi2 target       

Vanadium silicide , V3Si, VSi2 target   

 Zirconium disilicide, ZrSi2 targets