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plasma enhanced chemical vapor deposition PECVD furnace system 1
  • plasma enhanced chemical vapor deposition PECVD furnace system 1

plasma enhanced chemical vapor deposition PECVD furnace system

Model:CU-1200 PECVD
Brand:CYKY
Origin:Made In China
Category:Chemicals / Other Chemicals
Label:pecvd , pecvd system , pecvd furnace
Price: US $13000 / set
Min. Order:1 set
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Member Information

Detail

Product Description

CY-O1200-4CPECVD PECVD System

 

Brief Introduction:  

CY-O1200-4CPECVD is a compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 500W RF plasma source, 80mm O.D split tube furnace, 4 channels precision mass flow meter with gas mixing tank, and high quality mechanical pump. 

 

Technical Parameter:

Model

CY-O1200-4CPECVD

Tube Furnace

Display

LED

Max. Temperature

1200℃

Continuous Woking Temp.

≤1100℃

Heating Rate

0~20℃/min

Temperature Zone

Single

Accuracy

±1℃

Tube Size

Ф80mm x 1200mm

Temperature Control

PID automatic control via SCR power control

Heating curves

30 steps programmable

Power

220V, 50 Hz, single phase at max. 4KW

Plasma RF Power 
supply 

Output Power

5 -500W adjustable with ± 1% stability

RF frequency

13.56 MHz ±0.005% stability

Reflection Power

200W max.

Matching

Automatic

RF Output Port

50 Ω, N-type, female

Noise

<50 dB. 

Cooling

Air cooling.

Power 

220V, 50Hz

Ditial Vacuum Gauge

3.8x10-5 to 1125 Torr measurement range

Anti-corrosive, gas-type independent 

Vacuum Pump and valve

Heavy Duty Rotary Vane Vacuum Pump with max. vacuum pressure 10-2 torr.

KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve

Digital vacuum pressure gauge and display are installed with the furnace

Mass Flow meters

Four precision mass flow meters :

MFC 1: Gas flow range from 0~100 sccm

MFC 2&3: Control range from 0~200 sccm  

MFC 4: Control range from 0~500 sccm

One gas mixing tank is installed on bottom case with liquid release valve

4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually

Gas inlet fitting: four 1/4NPS

Gas outlet fitting: four 1/4NPS

Contact information:

contact person: Tanya Wang 

Mobile: +86 13526477203

Email: labfurnace@163.com

 


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plasma enhanced chemical vapor deposition PECVD furnace system 1
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Send Inquiry to this Member

Zhengzhou Kejia Furnace Co., Ltd

High-tech zone, zhengchou city, henan province, China

Phone:
86-371-67826992
Fax:
86
Contact:
Tanya Wang (sales manager)
Mobile:
13526477203

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