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Suitable for metal, semi-conductor, oxidizing, and organic film, OLED, PLED, Solar, and other applications
Evaporator would be integrated into either the floor or side wall of the glove box
Available in many configurations and work station sizes
Evaporator pressure limit: 6 x 10-5 Pa
Evaporator pumping time: ≤40 minutes (from atmospheric pressure to 8 x 10-4 Pa)
Maximum substrate size: 120x120mm
Lifting range: 50mm
Rotating speed: 5-30rpm; continuously adjustable
Maximum substrate temperature: 300° C
Organic Evaporation Source: Two beam furnace; Single quartz crucible capacity ≥2 cc; Maximum temperature: -500° C; Continuously adjustable
Thermal Evaporation Source: Two thermal evaporation boats; Four electrodes; Water cooling; 10V 300A; Maxiumum power output 3kW
FTM-V quartz crystal oscillation film thickness monitor display range: 0–99µ9999À°