| Model: | W-t |
|---|---|
| Brand: | - |
| Origin: | Made In China |
| Category: | Metallurgy , Mining & Energy / Metallurgy & Mining / Non-ferrous Metal Products |
| Label: | Tungsten target , w target , w metal |
| Price: |
-
|
| Min. Order: | 1 pc |
| Last Online:27 Jan, 2021 |
Application:
High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex and high-performance thin film materials. Because high-purity tungsten or ultra-pure tungsten (5 N or 6 N) has high resistance to electron migration, high temperature stability, and the ability to form stable silicides, it is often used as a thin film in the electronics industry as a gate, connection, transition and Barrier metal. Ultra-high-purity tungsten and its silicides are also used in ultra-large-scale integrated circuits as resistance layers, diffusion barriers, etc., and as gate materials and connection materials in metal oxide semiconductor transistors. Tungsten-titanium alloy sputtering targets are often used to make transition metal layers of thin-film solar cells.
Specification:
|
Name |
Molecular formula | Specification |
Size |
Relative density | Grain size | Defect rate | |
| Tungsten target |
W |
4N(99.99%) |
Inch |
mm |
≥99% |
≯50µm |
0 |
|
5N(99.999%) |
D(6,8,10,12) H(0.25,0.5,0.75) |
Diameter 150～350 Thickness 6～25 |
|||||
| Tungsten Titanium Target |
4N(99.99%) |
≥99% |
≯50µm |
0 |
|||
|
4N5(99.995%) |
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