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HMPS-2060SP 6kW/2450MHz

MPCVD Equipment

1. Description

The HMPS-2060SP, 6kW microwave plasma chemical vapor deposition (MPCVD) equipment is designed for multi-purpose with high stable and medium process pressure microwave plasma based on uses’ specific requirements. The system is built with advanced performance, perfect function, reasonable structure, ease of use, safety and reliability and great appearance, with all the characteristics it is especially suitable for the application of CVD progress of monocrystalline and polycrystalline diamond film. Chemical vapor deposition (CVD) of polycrystalline diamond film, surface treatment and modification of materials, as well as the growth of low temperature oxides.

2. Equipment composition and main features:

2.1. Microwave power generator

The system uses a newly developed 6kW/2450MHz solid-state microwave power generator. The microwave power is continuously adjustable from 0.1-6kW; the stability is better than ±1%; the ripple is better than 1%, and it has good control performance; the PLC provides convenient control; the perfect line safety blocking control system is adopted to make the system has a long service life. It has excellent electrical performance, safe and reliable, simple and convenient operation.

2.2. Waveguide transmission unit

The system uses an excellent microwave transmission system consisting of a high-performance microwave circulator, three-stub tuner, water load with reflected wave sampling, and a waveguide connected to the waveguide section. It ensures the good isolation of the reflected wave from the magnetron to make it work stably. Can easily adjust the best match when the plasma load changes, to achieve the best transmission of microwave power. And through the reflected wave sampling,  the reflected power and real - time working status are displayed in digital form.

2.3. Mode transformation and betting microwave coupling cavity

This is our new generation of relatively mature microwave mode conversion and coupling cavity, which is composed of a cylindrical cavity working in TM mode, a door-type coaxial waveguide coupler with adjustable coaxial coupling probe, and a plate quartz window. By adjusting the short-circuit piston of waveguide and coaxial coupling probe, the microwave power can be coupled to the plasma discharge chamber efficiently in a wide range of operation, and high-density, high-ionization, large area of uniform and stable microwave discharge can be generated. It adopts double-layer water-cooled cavity wall to ensure stable operation.

2.4. Multi-port plasma discharge chamber

This system uses a large-volume discharge chamber made of stainless steel welded with a double-layer water cooling structure. The upper end is connected to the microwave reaction chamber and is a continuation of the cylindrical chamber. It also has the following functional ports:

1) A revolving door type feeding and discharging window is set in front of the cavity, which can be easily put into the sample platform of no less than 50mm substrate. It is also equipped with a reticulated microwave shielding window, so as to clearly observe the discharge working condition in the cavity during operation; two observation windows and an infrared temperature measurement window are respectively provided in the left and right directions and the rear.

2) Specially designed inflatable flange is used to provide the main mixed gas, inflatable pipe and the inflatable ring near the substrate as a double-layer gas feed system composed of auxiliary inflatable pipes.

The above design makes the port water-cooled discharge chamber with large volume and complete functions, especially suitable for the needs of small batch plasma processing.

2.5. Lifting adjustment of substrate platform and cavity plate

The substrate platform is a water-cooled lifting structure, and the device can continuously adjust the cavity plate and the sample substrate platform respectively to make the plasma discharge area reach the best state, which is simple, reliable, and easy to control. Can meet the requirements of a variety of plasma processing technology.

2.6. Vacuum acquisition and measurement

The system selects 600L/s molecular pump and 8L/s vacuum pump as the pumping system, and the ultimate vacuum is better than 6x10-6 torr. The system is equipped with a medium to low pressure measurement gauge from atmospheric to 10-7 torr and a piezoresistive vacuum gauge from 0 to 500 torr. The measuring instrument is placed in the cabinet for easy control and reading.

The static seals use metal seals and silicone rubber; dynamic seals use metal bellows and magnetic fluid seal structures. The cavity air pressure control adopts MKS automatic controller, the air pressure control is stable and the adjustment is convenient.

2.7. Multi-channel gas Mass flow Control (MFC)

In order to ensure the process requirements of MPCVD, the system adopts the 4-way gas mass flow control system consisting of H2, CH4, O2 and N2 to supply and control the system (MFC). Each channel is equipped with a electromagnetic valve, filter and EP grade 1/4' tube circuit and 1/4'VCR connector are built into the equipment cabinet, the gas path is short, compact and easy to control.

2.8. Control system and cabinet

The system uses a compact and simple main structure and an independent control unit. Use PLC and touch screen for multi-parameter screen control and operation.

1) Touch screen display and operation include microwave power parameters, vacuum and operating air pressure values, gas flow parameters, substrate temperature values, etc. Meanwhile, tables and flow charts are used to make the operation more intuitive and convenient and reliable. It can realize multi-parameter setting automatic operation and control function.

2) The main control cabinet is equipped with functions such as over-current, over-temperature, automatic protection of water cut off, power supply indication, and fault indication. At the same time, it monitors the flow and temperature of key positions, such as magnetron cooling water and base cooling water.

3. General technical parameters of the equipment

1) Microwave generator and transmission waveguide

Operating frequency:       2450MHz

Output power: 0.1 ~ 6 kW continuously adjustable

Power stability: better than ±1% (at rated power level)

Ripple: better than 1%

Control mode: PLC control, 12-inch touch screen operation

Output waveguide interface: BJ-26, 22 with FD-26, 22 standard flange

Power input: 380VAC/50Hz, three-phase four-wire, separate ground, 11kW

Cooling water flow: ~15L/min

System standing wave coefficient: VSWR ≤ 1.5

Microwave leakage:  ≤2 mW/cm2

2) Microwave vacuum discharge chamber

Size and working mode: Φ200 x 300 (H) TM mode

3) Vacuum acquisition: 600L/s molecular pump, 8L/s two-stage vacuum pump

                  The ultimate vacuum degree is better than 6x10-6 torr ;    vacuum leak rate ≤10-9 Pa.m3/s

4) Gas mass flow rate:  4-way MFC: H2 (1 slm),  CH4 (100 sccm),

O2 (10 sccm),  N2 (5 sccm)

• Substrate table device: substrate platform diameter is Φ60 mm, water-cooled;

                     The effective adjustment of the substrate platform and cavity plate servo motor: 0~20 mm

6) Substrate temperature measurement: infrared temperature measurement range 300~1400℃ (monochrome)

7) Total power supply: 380VAC±5%/50Hz, three-phase four-wire, separate  ground wire, 12kW

• Total cooling water: >30L/min, clean soft water,

  inlet water temperature is 20℃±5℃;

                 Water pressure 0.4~0.6MPa

• Dimensions:  ~1.95(L) x 0.9 (W) x 1.85 (H) m
• Operating technical parameters:

   (1) The plasma discharge area is not less than Φ50mm in diameter; the discharge is stable without deviation;

   (2) Operating temperature: 600~1200℃ (infrared temperature measurement);                control accuracy ± 5℃

   (3) Operating air pressure: 10torr~200torr, control accuracy 0.1torr;

   (4) Long-term (>48h) continuous and stable work under normal conditions.

4. Equipment composition and configuration

Note: 1. The equipment conforms to relevant national electrical and   mechanical standards;

     2. Microwave leakage meets the requirements of national standards;

     3. Equipment warranty period: the whole machine warranty period is   one year.