Silica sol aqueous solution, CMP polishing slurry

Model:	-
Brand:	Huihe
Origin:	Made In China
Category:	Chemicals / Inorganic Chemical Materials / Oxide
Label:	CMP Polish , Grinding and polishi , Gallium arsenide pol
Price:	¥12 / pc
Min. Order:	30 pc

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Member Information

Jiangmen Huihe Yongsheng Nanotechnology Co. , Ltd.

Free MemberGuang Dong - China

Last Online:27 Mar, 2024

Product Description

CMP slurry characteristics.

The content of metal ions is very low, and the particle size distribution is uniform in monodisperse system. High consistency of product quality between batches. The size and shape of particles can be controlled freely. Be stable in dispersion and difficult to coalesce or settle. High speed, no crystal, easy to clear. The surface quality base is good, Chow ring has strong selection ability. Sapphire: SPS Stainless Steel: SLPS. Aluminum: AAPS. Silicon: ssps. Gallium Arsenide: Gaps. Hard Drive: dps. Artificial Body: Alps. Ceramics: CPS

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Jiangmen Huihe Yongsheng Nanotechnology Co. , Ltd.

Golden Age 24, Country Garden, Heshan

Phone:: 86-13392085230

Fax:

Contact:: Yanqing Li (Sales)

Mobile:: 13392085230

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