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This series of equipment uses cathode arc ion coating technology and magnetron sputtering technology, pulse bias technology combined with the same coating machine, this mode has become the current hardware ion coating mainstream technology.
It can be coated by arc or magnetron sputtering alone, or it can take advantage of the advantages of the two technologies to play a role in different stages of the coating process, such as cleaning and hitting the bottom layer with high-energy particles of the arc at the beginning of the coating to enhance the film/base bonding force; Then the coating is sputtered with medium frequency to obtain a fine and smooth coating. The device can also be equipped with an ion source to meet the needs of multifunctional coating.

Advantages:
• The flexibility to switch from one coating technology to another in seconds
• Can have multiple coating stages in the same cycle (multilayer coating)