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Magnetron sputtering metallizer is mainly used for decorative and functional reaction films, which has the advantages of high deposition rate and fast reaction speed, and completely overcomes the phenomenon of cathode target surface poisoning and abnormal glow discharge.

Metallizing single-layer films, multi-layer composite films, etc. on metal and non-metal substrates.

The updated cathode sputtering target and power supply have been configured.

According to customer product needs, multiple arc, planar target, cylindrical target, twin target, ion source, etc. can be selected.

Note: Special configuration can be provided according to customer process requirements.