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Equipment usage: The experimental furnace is a typical heat treatment equipment in semiconductor processing, used for diffusion, oxidation, annealing, alloying, and sintering processes in industries such as large-scale integrated circuits, discrete devices, power electronics, optoelectronic devices, and optical fibers.
  

Main technical parameters:
◆ Number of process tubes: 1-4 tubes
Process pipe diameter: Φ 90-360mm (3-12 inches)
Working temperature range: 400-1280 ℃
◆ Constant temperature zone length and accuracy ± 0.5 ℃/1080mm
Process uniformity: ≤± 5% (30~60 ohms)

◆ Structural type: horizontal hot wall type
Gas flow rate setting accuracy: ± 1% F S
◆ Airtightness of the pneumatic system: 1×10-7pa.m3/s