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PVA Wafer Sponge Brush Material: PVA sponge Features: round concave-convex surface, surface particles reduce uneven washing and wiping Shape: roller, plane, special shape Uses: CMP cleaning of semiconductor back-end, wafer (crystal side, crystal back, crystal surface) cleaning, LCD substrate, mask cleaning PVA Wafer Brush PVA wafer brushes, wiping cloths, and wiping blocks are suitable for wiping and cleaning of precision originals in the PCB, LCD, SMT, and WAFER wafer industries in clean rooms. PVA Brush sponge roller The round-grained concave-convex surface effectively washes and wipes the dirt, instead of the consumption of expensive cleaning fluid, effectively drains the sewage, and removes super-strong surface particles to reduce uneven washing. It is suitable for CMP process cleaning, wafer cleaning, LCD substrate, photomask... etc. in the back-end of semiconductor. The clean room is 10class. description