Product Description
AE-6000C-type flexible shaft crystal growth furnace is to melt silicon semiconductor materials by graphite resistance heater in an inert gas environment, Using czochralski Technique dislocation-free crystal growth equipment, it can produce high quality single crystal which for solar photovoltaic devices.
Main technical parameters
|
Properties
|
Model
|
AE-85
|
AE-95
|
AE-120
|
Diameter of Growth Tank (mm)
|
850
|
950
|
1200
|
Ingot diameter (inch)
|
6 - 8
|
8 - 10
|
8-16
|
Silica crucible size (inch)
|
18-20
|
22-24
|
24-28
|
Max charge amount (Kg)
|
95
|
150
|
260
|
Max crystal length (mm)
|
2000
|
2000
|
2000
|
Seed pulling rate(mm/Hr)
|
0-508
|
0-508
|
0-508
|
Seed Jog Speed (mm/Min)
|
0-508
|
0-508
|
0-508
|
Seed rotation rate (rpm)
|
0-40
|
0-40
|
0-40
|
Crucible Elevate Rate (mm/Hr)
|
0-128
|
0-128
|
0-128
|
Crucible Jog Speed (mm/Min)
|
0-50.8
|
0-50.8
|
0-50.8
|
Crucible rotation rate (rpm)
|
0-20
|
0-20
|
0-20
|
Crucible Travel stroke (mm)
|
400
|
420
|
480
|
Maximum weight for
crucible support (Kg)
|
165
|
230
|
450
|
Main line pump rate (SL/Sec)
|
70
|
70
|
150
|
Auxiliary pump rate (SL/Sec)
|
8
|
8
|
8
|
Ultimate pressure (Pa)
|
less than 4
|
less than 4
|
less than 4
|
Permissible leak rate (Pa/Hr)
|
less than 6
|
less than 6
|
less than 6
|
Gas flow control range (SL/Min)
|
4-200
|
4-200
|
4-200
|
Working pressure range (Pa)
|
1500-5000
|
1500-5000
|
1500-5000
|
AC power input (3 phase, 380V)
|
140 KW
|
200 KW
|
250 KW
|
Number of Heating Elements
|
1
|
2
|
2
|
Magnetic Coil
|
Optional
|
Optional
|
Optional
|
|
Main technical parameters
|
Properties
|
Model
|
AE-85
|
AE-95
|
AE-120
|
Diameter of Growth Tank (mm)
|
850
|
950
|
1200
|
Ingot diameter (inch)
|
6 - 8
|
8 - 10
|
8-16
|
Silica crucible size (inch)
|
18-20
|
22-24
|
24-28
|
Max charge amount (Kg)
|
95
|
150
|
260
|
Max crystal length (mm)
|
2000
|
2000
|
2000
|
Seed pulling rate(mm/Hr)
|
0-508
|
0-508
|
0-508
|
Seed Jog Speed (mm/Min)
|
0-508
|
0-508
|
0-508
|
Seed rotation rate (rpm)
|
0-40
|
0-40
|
0-40
|
Crucible Elevate Rate (mm/Hr)
|
0-128
|
0-128
|
0-128
|
Crucible Jog Speed (mm/Min)
|
0-50.8
|
0-50.8
|
0-50.8
|
Crucible rotation rate (rpm)
|
0-20
|
0-20
|
0-20
|
Crucible Travel stroke (mm)
|
400
|
420
|
480
|
Maximum weight for
crucible support (Kg)
|
165
|
230
|
450
|
Main line pump rate (SL/Sec)
|
70
|
70
|
150
|
Auxiliary pump rate (SL/Sec)
|
8
|
8
|
8
|
Ultimate pressure (Pa)
|
less than 4
|
less than 4
|
less than 4
|
Permissible leak rate (Pa/Hr)
|
less than 6
|
less than 6
|
less than 6
|
Gas flow control range (SL/Min)
|
4-200
|
4-200
|
4-200
|
Working pressure range (Pa)
|
1500-5000
|
1500-5000
|
1500-5000
|
AC power input (3 phase, 380V)
|
140 KW
|
200 KW
|
250 KW
|
Number of Heating Elements
|
1
|
2
|
2
|
Magnetic Coil
|
Optional
|
Optional
|
Optional
|
|
AE-6000C-type flexible shaft
crystal growth furnace is to melt silicon semiconductor materials by graphite resistance heater in an inert gas environment, Using czochralski Technique dislocation-free crystal growth equipment, it can produce high quality single crystal which for solar photovoltaic devices.
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