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Results Showing
1-48
1
Zinc Oxide (ZnO) sputtering targets, Purity: 99.99%, CAS: 1314-13-2
US $200
1
Brown aluminium oxide 0-1-3MM powder and grains
US $950
1
White aluminium oxide powder and grit for abrasive media
US $860
1
white aluminium oxide 99% AL2O3 powder for abrasive media and refractory
US $900
BESTCOLOR 100
Indium Tin oxide (In2O3-SnO2) ITO sputtering target CAS 50926-11-9
US $200
Tungsten oxide doped Lithium (WO3-Li) sputtering targets
US $1000
Aluminum Zinc oxide (AZO) sputtering targets CAS 1314-13-2 and and 1344-28-1
US $200
Barium Zirconium Yttrium Oxide (BaZrYO3) sputtering targets
US $200
Copper tin oxide (Cu2SnO4) targets use in thin film coating
US $200
Barium Strontium Titanate (BaSrTiO3) sputtering targets use in thin film coating
US $200
Indium Gallium Zinc Oxide, In2O3-Ga2O3-ZnO (IGZO) sputtering targets
US $300
Bismuth Dysprosium Iron Gallium Oxide BiDyFeGaO12 sputtering targets
US $500
Indium oxide (In2O3) sputtering target use in thin film coating CAS 1312-43-2
US $200
Lithium Oxide Li2O powder CAS 12057-24-8 battery material
US $500
Tungsten oxide (WO3, WO2.9) sputtering targets, Purity: 99.95%, CAS 1314-35-8
US $200
Tantalum pentoxide (Ta2O5) sputtering targets CAS 1314-61-0
US $100
Hafnium oxide (HfO2) sputtering target CAS 12055-23-1
US $200
Aluminum oxide (Al2O3) sputtering target use in thin film coating CAS 1344-28-1
US $200
Niobium penoxide (Nb2O5, Nb2Ox) sputtering target CAS 1313-96-8
US $200
Cobalt oxide (Co3O4) target use in thin film coating CAS 1308-06-01
US $200
Cuprous Oxide (Cu2O, CuO) targets CAS 1317-39-1 and 1317-38-0
US $100
Iron oxide (Fe3O4, Fe2O3) targets use in thin film coating CAS 1332-37-2
US $200
Molybdenum trioxide (MoO3) target use in thin film coating CAS 1313-27-5
US $200
Silicon monoxide (SiO) target use in thin film coating CAS 10097-28-6
US $200
Silicon dioxide (SiO2) targets use in thin film coating CAS 60676-86-0
US $200
Tin oxide (SnO2, SnO) sputtering targets, purity: 99.9%, CAS: 18282-20-5
US $200
Titanium oxide (TiO2) sputtering targets, purity: 99.99%, CAS: 13463-67-7
US $200
Titanium trioxide (Ti2O3) sputtering targets, purity: 99.99%, CAS: 1344-54-3
US $200
Zirconium oxide (ZrO2) sputtering targets, purity: 99.95%, CAS: 1314-23-4
US $200
Vanadium oxide (V2O5, VO2) sputtering targets, CAS: 1314-62-1
US $200
Nickel oxide NiO sputtering targets CAS: 1313-99-1
US $200
Silver Oxide Ag2O sputtering targets CAS 20667-12-3
US $200
Tellurium Dioxide (TeO2) white powder, DVD grade 99.999% purity, CAS 7446-07-3
US $300
Gadolinium Barium Copper Oxide GdBaCuO supperconduction sputtring targets
US $200
Magnesium oxide (MgO) crystal granules optics coating material CAS:1309-48-4
US $300
Zirconium oxide ZrO2 evaporation or thin film coating material CAS: 1314-23-4
US $200
Aluminum oxide (Al2O3) optical thin film coating material, CAS 1344-28-1
US $50
Germanium oxide (GeO2) sputtering target CAS 1310-53-8
US $350
Abrasive white corundum fused alumina powder and grit
US $800
Abrasive white corundum powder and grit
US $800
White corundum powder and grit
US $800
White aluminum oxide powder and grit
US $800
White fused alumina
US $800
White corundum lumps
US $800
White fused alumina micro powder
US $800
FEPA grade abrasive grinding polishing White fused alumina micro powder
US $800
Abrasive grinding polishing White fused aluminum oxide micropowder
US $800
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