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evaporation
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Aluminum (Al) metal
evaporation
material
CAS 7429-90-5
US $200
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Tungsten (W) metal
evaporation
material
use in thin film coating CAS 7440-33-7
US $150
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Silicon monoxide (SiO) target use in thin film coating CAS 10097-28-6
US $200
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Titanium Aluminium (Ti-Al) Sputtering targets
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Nickel-Chromium (NiCr) alloy targets use in evaporation or thin film coating
US $200
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Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0
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Nickel-Vanadium (NiV) alloy targets use in evaporation or thin film coating
US $200
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Titanium oxide Ti3O5 granules use in thin film coating CAS 12065-65-5
US $300
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Zirconium oxide ZrO2 evaporation or thin film coating material CAS: 1314-23-4
US $200
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Molybdenum trioxide MoO3 granules use in thin film coating CAS 1313-27-5
US $200
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Aluminum (Al) metal sputtering targets CAS: 7429-90-5
US $100
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Antimony (Sb) metal sputtering targets, Purity: 99.99%, CAS: 7440-36-0
US $200
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Chromium (Cr) metal sputtering targets CAS: 7440-47-3
US $100
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Molybdenum (Mo) metal sputtering targets, Purity: 99.95%, CAS: 7439-98-7
US $100
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Rhenium (Re) sputtering targets CAS 7440-15-5
US $300
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Niobium (Nb) metal sputtering target use in planner display thin film coating
US $200
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Calcium Ca sputtering targets use in thin film coating CAS 7440-70-2
US $300
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Molybdenum Sputtering Target
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Metal Alloy Sputtering Target
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Evaporation
Material
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Vacuum
evaporation
material
s Ta2O5
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Silicon monoxide (Chemical formula: SiO)
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Magnesium fluoride (MgF2)
US $48
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FPD Sputtering target
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Ceramic Sputtering target
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metal powder
evaporation
material
s
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sputtering target
material
s
US $25
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sputtering target
evaporation
material
s
US $50
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evaporation
material
s
US $50
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Evaporation
Material
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Evaporation Pellets & Pieces
US $30
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V sputtering target 3N China target manufacture
evaporation
coating
material
s
US $45
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