Q300T D型大腔室多功能高真空雙頭離子濺射鍍膜儀是設計用於薄膜鍍膜的儀器，它也是鎢燈絲和場發射掃描電鏡觀察之樣品制備的理想鍍膜儀。樣品可用不氧化金屬（貴金屬）如金（Au）鉑（Pt）鍍膜，也可用銥（Ir）鍍制具有精細顆粒結構的膜層。
它的主要特點是：
•Automated sequential sputtering 自動順序濺射兩層不同的成膜材料
•Dual sputter head 雙濺射鍍膜頭
•Large format chamber 大腔室（300 mm D x 127 mm H，可選214mmH的高腔室）
•Coat logging facility 鍍膜日誌功能（記錄最後100條執行過的鍍膜參數）
•Fully automated touch-screen control 全自動觸摸屏控制
•Customer defined coating protocols 用戶自定義鍍膜方案
•High resolution turbomolecular pumping渦輪分子泵抽真空，高分辨鍍膜
•Vacuum shutdown 真空閉鎖功能
•Dual channel film thickness monitor module，Q300T D can be fitted with an optional dual film thickness monitor (FTM), which measures the coating thickness on two quartz crystal monitors located within the chamber 雙通道膜厚監控模塊
•A flat, adjustable stage capable of accepting 4” (101.6 mm) wafers is supplied as standard with the Q300T D. This stage has a rotation speed of 14 to 38 rpm.As an accessory a 6”(152.4 mm) wafer stage is available  大樣品台
•An optional lockable emergency stop switch is located in a position easily accessible for the operator, on top of the coater, to immediately cut power to the unit. 緊急停止開關