Tantalum sputtering target
| 型號： | - |
|---|---|
| 品牌： | - |
| 原產地： | 中國 |
| 類別： | 冶金礦產、能源 / 冶金礦產 / 有色金屬合金 |
| 標籤︰ | - |
| 單價： |
-
|
| 最少訂量： | - |
產品描述
Tantalum sputtering target
Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mm x Length
up to 2000mm
Purity: >=99.95% or 99.99%
Table 1: technology parameter
|
Grade
|
3N, 3N5, 4N, with Ta 99.99%min
|
|
Recrystallization
|
95%min
|
|
Grain size
|
ASTM 4 or finer
|
|
Surface finish
|
16Rms max. or Ra 0.4 ( RMS64 or better)
|
|
Flatness
|
0.1mm or 0.15% max
|
|
Tolerance
|
+/-0.010" on all dimensions
|
Table 1. Chemical composition:
|
Chemistry ppm
|
|||||||||||||
|
Designation
|
Chief component
|
Impurities maxmium
|
|||||||||||
|
Ta
|
Nb
|
Fe
|
Si
|
Ni
|
W
|
Mo
|
Ti
|
|
O
|
C
|
H
|
N
|
|
|
Ta1
|
Remainder
|
300
|
40
|
30
|
20
|
40
|
40
|
20
|
|
150
|
40
|
15
|
20
|
|
Ta2
|
Remainder
|
800
|
100
|
100
|
50
|
200
|
200
|
50
|
|
200
|
100
|
15
|
100
|
|
TaNb3
|
Remainder
|
＜35000
|
100
|
100
|
50
|
200
|
200
|
50
|
|
200
|
100
|
15
|
100
|
|
TaNb20
|
Remainder
|
170000-
230000
|
100
|
100
|
50
|
200
|
200
|
50
|
|
200
|
100
|
15
|
100
|
|
Ta2.5W
|
Remainder
|
400
|
50
|
30
|
20
|
30000
|
60
|
20
|
|
150
|
50
|
15
|
60
|
|
Ta10W
|
Remainder
|
400
|
50
|
30
|
20
|
110000
|
60
|
20
|
|
150
|
50
|
15
|
60
|
Special requirements to be agreed on by the supplier and buyer of negotiations
會員信息
| 宜興格瑞斯鉭鈮材料有限公司 | |
|---|---|
| 國家/地區︰ | 江苏省无锡市 |
| 經營性質︰ | 生產商 |
| 聯繫電話︰ | 137713045667 |
| 聯繫人︰ | 蔣林 (銷售經理) |
| 最後上線︰ | 2013/06/03 |
