Product: Tetrafluoromethane R14
 
Formular: CF4

Property of chloride :
Melting Point, °C -183.6
Critical Temperature, °C -45.67
Critical Pressure, Mpa  3.73
Critical density, m3/mol  7.1

Application: CF4 can be widely used in etching of silicon, SiO2, SiN4, phosphorus silicon glas and tungsten film material, and also can be used in the electronic components surface cleaning and solar battery production, laser technology, space technology, metal smelting, meteorological insulation, low temperatur refrigeration and etc.