ZnO Sputtering Target
 
Grade:99.99%
 

Chemical Composition:

    1.ZnO Target, Purity (wt%) 99.99% min
 
    2.Impurity Content: Unit PPm

Element Fe Cu Pb Cd Ni Mn K Na  Ca Sb  Mg Si
Content 8  5  9  6  9  5  5  4  3   6  5  8

Density:

    1.Density of target: 5.5g/cm3 min

    2.Relative densityof target: 98% min

Target color: Pale yellow

Shape: Square/Round, According to your request

Max Size: 400mm; 400× 250× 15mm or as customer'request.

Customization is available

Application:

Zinc oxide target is a good semiconductor materials, which are widely used in: liquid crystal display, thin film transistor,  diodes, thin film solar cells, etc.,