Model JS2D is designed to dry two or four carriers simultaneously.
　 With a clean filter installed in the upper part, clean air is constantly introduced to the inside of
　 the machine to keep the chamber clean. (Optional D.I rinsing available)

The Dryer uses no IPA, drying the wafers by spinning them at high speed
while allowing a ultra clean stream of dry air from the cleanroom to pass
over them. This leaves a clean dry surface with no water marks and particle
performance of less then 20 adders at 0.3 um in size.