. quartz crucible can be used in the 1450 degrees below, transparent and opaque two. Using a semi transparent quartz crucible arc method is drawinglarge diameter silicon based materials, essential for the development of large scale integrated circuit. Today, the world semiconductor industry developed countries have used the crucible instead of transparent quartz crucible small.He has high purity, strong heat resistance, large size of high precision, good heat insulation, energy saving, stable quality etc..

2, can not touch and HF, high temperature, carbonate was easily and caustic alkali and alkali metal.

3 quartz crucible is suitable for K2S2O7, KHSO4 for the flux melt samples andusing Na2S207 (first in 212 degrees drying) as flux sample processing.

4 quartz brittle, easily broken, should pay attention to when using