Os target PVD sputtering target

Os target PVD sputtering target
Model:Os1
Brand:Precious metals
Origin:Made In China
Category:Metallurgy , Mining & Energy / Metallurgy & Mining / Non-ferrous Metal
Label:Os targets , Os target , sputtering target
Price: US $300 / g
Min. Order:100 g

Product Description

Company's products include:

1, and high pure metal target material: Silicon target Si, and zirconium target Zr, and nickel target Ni, and chromium target Cr, and titanium target Ti, and aluminum target Al, and Tin target Su, and vanadium target v, and antimony target Sb, and Indium target In, and boron target b, and manganese target Mn, and bismuth target Bi, and copper target Cu, and tantalum target Ta, and niobium target Nb, and zinc target Zn, and magnesium target Mg, and tungsten target w, and MO target Mo, and cobalt target Co, and iron target Fe, and germanium target Ge, and HF target Hf, and lead target Pb, and SE target Se, and beryllium target Be, and TE target Te, and carbon target c, and graphite target, and stainless steel target, and Target Sc-Si of single crystal silicon, polycrystalline silicon targets.

2, the precious metal target: Target gold Au, silver target Ag, platinum target Pt, Pd target Pd, Ir target Lr, target ruthenium Ru, rhodium target Rh, Os osmium target, etc.

3, Metal alloy target material: titanium aluminum target TiAl, and titanium zirconium target TiZr, and titanium Silicon target TiSi, and titanium nickel target TiNi, and Nickel chromium target NiCr, and nickel aluminum target NiAl, and nickel vanadium target NiV, and nickel iron target NiFe, and iron cobalt target FeCo, and aluminum Silicon target AlSi, and titanium Silicon target TiSi, and chromium Silicon target CrSi, and zinc aluminum target ZnAl, and titanium zinc target material TiZn, and Palladium silver alloy target, and Copper Indium Gallium se target material, Copper Indium Gallium target material.

4, Ceramic target material: (zinc oxide aluminum target) AZO target, and ITO target (oxidation indium tin target), and IGZO target material (oxidation Indium Gallium zinc), and zinc oxide target ZnO, and carbide boron target B4C, nitride boron target B4N, and silicon carbide target SiC, oxidation Silicon target SiO2, and titanium dioxide target TiO2, oxidation zirconium target ZrO, and magnesium oxide target MgO, sulfide zinc target ZnS, and alumina target Al2O3, and five oxidation II tantalum target Ta2O5, five oxidation II niobium target Nb2O5, iron oxide target, compounds target.

5, re target: La target target target Ce La, CE, PR Pr Nb, SM and ND target target target Eu of Sm, EU, GD targets Gb Tb, dy, TB targets target Dy erbium, holmium targets Ho and the target Er, thulium targets target Yb, lutetium targets Tm, Yb y Lu, y target ...

Purity: 99%, 99.9%, 99.95% 99.99%, 99.995% 99.999% and 99.9999%.

Shape: plate, wafer, rectangular, square, circle, tube, wafer level, level rectangular, customized

Dimensions: diameter, length, width and thickness according to customer's order!

Os target PVD sputtering target 1

Member Information

Shanghai shuosong electronic technology Co., LTD.
Country/Region:Shang Hai - China
Business Nature:Manufacturer
Phone:13564135680
Contact:Andy Chen (Manager)
Last Online:12 Oct, 2024