The AW-2001R  single-wafer Etcher is an automated tool designed as a flexible downstream Microwave system for high-volume wafer fabrication. AW-2001R is in direct response to manufacturer’s concerns for wafer damage, uniformity, uptime, reliability and production-proven technology

AW-2001R  Applications:

Contact Slope Etch

Via Etch

BPSG Etch

LTO Etch

TEOS Etch

Thermal Oxide Etch

LPCVD Nitride Etch

PECVD Nitride Etch

Trench Rounding

Descum

RIE Damage Removal

Sodium Removal

Planarization

Backside Etch (Poly, Nitride, or Oxide)

Nitride Pattern Removal (PBL, LOCOS w/ Pad Ox = >400Å)

Low Temp Photoresist Ashing over Oxides, Poly, Al, W, Ti, or Moly

AW-2001R  Key Features:

Production-proven plasma etching system.

No damage downstream plasma etcher(≤0.1 Volt CV-shift )

“Extended” Alumina Plasma Tube for better uniformity.

Frontside isotropic etch and backside etch if pins-up

75mm-150mm wafer capability.

Varied wafer sizes capability without hardware change if necessary.

Integrated 3-axis robotic wafer handling for increased throughput and less wafer breakage.

Optional alignment/cooling station to prevent wafer breakage

Water-Cooled 1000W Magnetron/Waveguide with an AGL 2.45GHz Microwave Power Generator for better process repeatability.

Can handle 50um thickness wafer

PC controller with Advanced Allwin21 Software Package with touch screen monitor GUI

Can handle 50um thickness wafer

4 isolated gas lines with MFC’s

Pressure control for process repeatability

EMO, Interlocks and Watchdog function

GEM/SECS II interface, Optional

Light Tower, Optional

Small Footprint

 Made in U.S.A.

AW-2001R  Software Key Features:

Real time graphics display (GUI), process data acquisition, display, and analysis.

Closed-loop process parameters control.

Precise parameters profiles tailored to suit specific process requirements. 

Programmable comprehensive calibration of all subsystems from within the software.  This allows faster, easier calibration, leading to enhanced process results.

Recipe creation. It features a recipe editor to create and edit recipes to fully automate the processing of wafers inside the process chamber.

Validation of the recipe so improper control sequences will be revealed.

Storage of multiple recipes, process data and calibration files so that process and calibration results can be maintained and compared over time.

Passwords provide security for the system, recipe editing, diagnostics, calibration and setup functions

Simple and easy to use menu screen which allow a process cycle to be easily defined and executed.

Troubleshooting features which allows engineers and service personnel to activate individual subassemblies and functions. More I/O, AD/DA “exposure”.

DB-25F parallel (printer) port.  The computer interfaces to the Allwin21 system with only one cable: the control interface cable.

The control board inside the machine that translates the computer commands to control the machine has a watchdog timer.  If this board looses communication with the control software, it will shut down all processes and halt the system until communication is restored.

GEM/SEC II function (Optional)

AW-2001R  Specifications:

Wafer Size: 2, 3, 4, 5, 6 inch Capability.

Chuck Temperature: 60-110ºC (±2 ºC)

Gases: NF3 CF4 HE O2

Uniformity:

100mm : ± 3% (5% 3 sigma) *

150mm : ± 5% (8% 3 sigma) *

*max.- min. /2 x average

Reproducibility (w-t-w): 10% 3 sigma

Particulate: 0.05p/cm2 > 0.3µm

NO DAMAGE: ≤0.1 Volt CV-shift

* Contact Allwin21 sales for other applications and specifications

AW-2001R Configuration:

Main Frame with Breakers, Relays and Wires

Pentium Class PC with AW Software

Keyboard, Mouse, USS with SW backup and Cables

Fixed Cassette Stations:1 Two Cassette Stations, or One Cassette Station / One Centering/Alignment Station

Door Assembly

Metal Shower head

"Extended' Alumina Plasma Tube for better Uniformity.

Orifice, Gas Cap

Chamber Body and Top Plate

Main Control , Distributor PCB and DC

H1 -7X10.5 Integrated 3-Axls Solid Robot

Water-Cooled Magnetron and Waveguide

Water-Cooled 1000W Magnetron/Waveguide with an AGL 2.45GHz Microwave Power Generator

4 Isolated Gas Lines with Pneumatic Valves and MFC

AC Box

Main & Slow Vacuum Valves

MKS Baratron

Throttle Valve

Front EMO, Interlocks

15-rnch Touch Screen GUI

AW-2001R  Options:

GEM/SECS II function (Software)

Light Tower

Vacuum Pump

Keywords:Plasma Etcher, Plasma Etching, Dry Etching, Dry Clean, Semiconductor Equipment, Used Semiconductor Equipment, Semiconductor Process Equipment, Gasonics AE 2001, Microwave Etcher, Microwave Plasma Etcher, Microwave Etch