Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0

Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0
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Category:Metallurgy , Mining & Energy / Metallurgy & Mining / Non-ferrous Metal Alloy
Label:Ni3Al alloy targets , sputtering targets , evaporation material
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Product Description

Aluminum Nickel (Al-Ni) alloy sputtering targets use in evaporation or thin film coating

purity: 99.9%

Composition:   Al/Ni=3/1at  and Al/Ni=1/1at   or made by request

Size: max. 355.6mm (14 inch) ,

Length: 500mm max x Width 200mm x thickness 20mm max.,

Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing

 

We have only listed the more popular material. Please feel free contact us with any special requirements at any times, we will try to get back for you ASAP.

specification:purity: 99.9%
Composition:   Al/Ni=3/1at  and Al/Ni=1/1at   or made by request
Size: max. 355.6mm (14 inch) ,
Length: 500mm max x Width 200mm x thickness 20mm max.,
Shape: Discs, disks, rod, step disk, delta, plate, sheets or made per drawing
Aluminum Nickel (Al-Ni) alloy sputtering targets CAS 7429-90-5 and 7440-02-0 1

Member Information

TYR TECH MATERIAL LIMITED
Country/Region:Guang Dong - China
Business Nature:Manufacturer
Phone:13829980019
Contact:Amy Qiu (Manager)
Last Online:10 Oct, 2023