High purity nickel chromium alloy sputtering target, nickel chromium alloy target material

Chemical symbol: Ni

Specification: target, ingot, can be customized according to customer demand!

Ratio: 80: 20, 90: 10, 95: 5, 70: 30, 60: 40, 50: 50, 40: 60 and so on can be melted

Vacuum melting

Deposition technology: vacuum evaporation

Boat: Al2O3

Melting point: 1,395 ℃

Coil: w, ta, mo

Evaporation temperature at 10: 1217 ℃

Square resistance of RS / Ω □ - 1: 10-4

Resistance temperature coefficient ( TCR ) / ℃: ( 1 ~ 2 ) × 10-4

Mechanical and chemical properties of film: alloys with refractory metals

Note: professional production r & d nickel chromium alloy, nickel vanadium alloy, alloy target, metal target, evaporate material / granule