CMP slurry characteristics.

The content of metal ions is very low, and the particle size distribution is uniform in monodisperse system. High consistency of product quality between batches. The size and shape of particles can be controlled freely. Be stable in dispersion and difficult to coalesce or settle. High speed, no crystal, easy to clear. The surface quality base is good, Chow ring has strong selection ability. Sapphire: SPS Stainless Steel: SLPS. Aluminum: AAPS. Silicon: ssps. Gallium Arsenide: Gaps. Hard Drive: dps. Artificial Body: Alps. Ceramics: CPS