CHOTEST CP200 Nano Stylus Profiler Benchtop Profilometry Thickness Surface Measu

CHOTEST CP200 Nano Stylus Profiler Benchtop Profilometry Thickness Surface Measu
Model:CP200
Brand:CHOTEST
Origin:Made In China
Category:Electronics & Electricity / Electronic Instrument / Electronic Measurment Apparatus
Label:profiler , nano measurement , semiconductor
Price: US $1 / pc
Min. Order:1 pc

Product Description

Product Description

Stylus Nano Profiler - CP200

 

Stylus Nano Profiler CP200 is an ultra-precision contact measuring instrument for measurement of surface roughness and microscopic profile, such as micro-nano step height, film thickness.The CP200 uses a displacement sensor with sub-angstrom resolution, ultra-low noise signal acquisition, ultra-fine motion control, and calibration algorithms technology with excellent performance. Its contact force is extremely small, and there are no special requirements for measuring surface reflection characteristics, material types, and material hardness, consequently, it is widely used to measure microscopic surface for industries of semiconductors and compound semiconductors, high-brightness LEDs, solar energy, MEMS micro-electromechanical systems, touch screens, automotive and medical equipment.

Parameters

CHOTEST CP200 Nano Stylus Profiler Benchtop Profilometry Thickness Surface Measurement for Wafer and Thin Film

Model No. CP200
Measurement Technology Stylus Scanning
Navigation Camera 5MP pixels colorful camera, FOV 2200×1700μm
Sensor Ultra low Inertia, LVDC sensor
Measuring Force 1-50mg Adjustable
Stylus Tip radius 2μm, angle 60°
Object
Table
XY Travel Range 150mm×150mm, Motorized
Rotation 0~360°, Motorized
Max Scanning Length 55mm
Max Sample Height 50mm
Max Wafer Size 150mm(6”), 200mm(8”)
Step Height Repeatability 5 Å @ Range 330μm/ 10 Å @ Range 1mm (Measure step height 1μm, 1δ)
Sensor Range*1 330μm or 1mm
Vertical Resolution Resolution<0.01 Å(When the grade is 13μm)
Scanning Speed 2μm/s ~ 10mm/s
Size(L×W×H) 640×650×530mm
Weight 40kg
Input AC100~240V, 50/60 Hz, 200W
Working Environment Humidity: 30~40% RH(No condensation);
Temp.: 16~25°C(Fluctuation < 2°C/h);
Audio noise: ≤80d;
Ground vibration: 6.35μm /s(1~ 100Hz);
Air laminar flow: ≤ 0.508 m/s(Downward flow)

Remark:

*1 The sensor range can only be selected either 330μm or 1mm.

Functions

  • Parameter measurement function
    1) Step height: It can measure step heights from nanometers to 330μm or 1050μm, and can accurately measure materials deposited or removed during processes such as etching, sputtering, SIMS, deposition, spin coating, CMP, etc.
    2) Roughness and waviness: It can measure the roughness and waviness of the sample. The analysis software can obtain dozens of parameters such as Ra, RMS, Rv, Rp, Rz, etc. related to roughness and waviness by calculating the scanned microscopic profile curve.
    3) Stress measurement: It can measure the surface stress of various materials.
  • Measurement mode and analysis function
    1) Single-area measurement mode: After completing Focus, set the scanning start point and scanning length according to the image navigation map, and start measuring.
    2) Multi-area measurement mode: After completing Focus, complete the single-area scanning path setting according to the image navigation map. The multi-area measurement mode consisting of several to tens or hundreds of scanning paths can be arrayed according to the horizontal and vertical distances. All scanning paths can be automatically measured with one click.
    3) 3D measurement mode: After completing Focus, complete the single-area scanning path setting according to the image navigation map, and complete the setting of the entire scanning surface area according to the required scanning area width or the spacing and number of scanning lines. The scanning and 3D image reconstruction of the entire scanning surface area can be automatically completed with one click.
    4) SPC statistical analysis: Supports analysis of multiple index parameters for different types of test pieces, and provides SPC charts for the measurement data of batch samples to show the trend of statistical data changes.
  • Dual navigation optical imaging function
    The NS200-D model is equipped with a 500W pixel color camera for normal or oblique viewing. The scanning path can be accurately set in the normal navigation imaging system, and the scanning trajectory can be followed in real time in the oblique navigation imaging system.
  • Quick needle replacement function
    The magnetic probe is used. When the needle replacement operation is required, the scanning probe can be quickly replaced on site, and the calibration module in the software is quickly calibrated to ensure the accuracy and repeatability after the needle replacement, reducing maintenance troubles.

Applications

Stylus Nano Profiler CP200 has strong adaptability to application scenarios. It has no special requirements on the reflectivity characteristics, material type and hardness of the sample being tested. It can be widely used in industrial enterprises and scientific research institutions such as universities and colleges in various industries such as semiconductors, solar photovoltaics, optical processing, LEDs, MEMS devices, and micro-nano material preparation. Its accurate characterization of surface microscopic morphology parameters is of great significance for the evaluation of related materials, performance analysis and improvement of processing technology.

CHOTEST CP200 Nano Stylus Profiler Benchtop Profilometry Thickness Surface Measurement for Wafer and Thin Film

CHOTEST CP200 Nano Stylus Profiler Benchtop Profilometry Thickness Surface Measu 1CHOTEST CP200 Nano Stylus Profiler Benchtop Profilometry Thickness Surface Measu 2CHOTEST CP200 Nano Stylus Profiler Benchtop Profilometry Thickness Surface Measu 3

Member Information

Chotest Technology Inc.
Country/Region:Guang Dong - China
Business Nature:Manufacturer
Phone:18665841195
Contact:Vincent HU (Sales)
Last Online:21 Oct, 2024

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