High-purity aluminum target, aluminum oxide target, magnetron sputtering targets

High-purity aluminum target, aluminum oxide target, magnetron sputtering targets
Model:-
Brand:-
Origin:Made In China
Category:Metallurgy , Mining & Energy / Metallurgy & Mining / Non-ferrous Metal Alloy
Label:aluminum target , aluminum oxide targe , magnetron sputtering
Price: ¥150 / pc
Min. Order:1 pc

Product Description

Aluminum (Al) Sputtering Targets Overview

Ours puttering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact Our for current pricing or for a quote on sputtering targets and other deposition products not listed.

Aluminum (Al) General Information

Aluminum is one of the most common metals in the world. It can be found in kitchen utensils, cars, street lights, and the popular aluminum foil food packaging. Aluminum is a silvery-white, metallic material. It is light, malleable, ductile, and non-magnetic under normal conditions. It has a density of 2.7 g/cc, a melting point of 660°C, and a vapor pressure of 10-4 Torr at 1,010°C. Although it is not a strong material, it is a good conductor of heat and electricity and is able to form an oxide layer that is resistant to corrosion. Due to its high reactivity, it is rarely found in nature as a free element. When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. It is widely used in the aerospace, automotive lighting, OLED, and optical industries.

Aluminum (Al) Specifications

Material Type

Aluminum

Symbol

Al

Atomic Weight

26.9815386

Atomic Number

13

Color/Appearance

Silvery, Metallic

Thermal Conductivity

235 W/m.K

Melting Point (°C)

660

Coefficient of Thermal Expansion

23.1 x 10-6/K

Theoretical Density (g/cc)

2.7

Z Ratio

1.08

Sputter

DC

Max Power Density
(Watts/Square Inch)

150*

Type of Bond

Indium, Elastomer

Comments

Alloys W/Mo/Ta. Flash evap or use BN crucible.

 

 

Aluminum (Al) and other alloy forms

According to chemical composition, aluminum alloys can be divided into aluminum-silicon alloys AlSi, aluminum-copper alloys AlCu, aluminum-magnesium alloys AlMg, aluminum-zinc alloys AlZn, and aluminum rare earth alloys, among which aluminum-silicon alloys have simple aluminum-silicon alloys (which cannot be strengthened by heat treatment, and their mechanical properties are relatively Low, good casting performance), special aluminum-silicon alloy (can be heat treated to strengthen, high mechanical properties, good casting performance).

 

Other sputtering targets and evaporated particles are Aluminum Copper, (Al/Cu),Aluminum Silicon, (Al/Si),Aluminum Silicon Copper, (Al/Si/Cu) ,Aluminum Titanium, (Al/Ti) etc.

 

Payment Terms:TT
High-purity aluminum target, aluminum oxide target, magnetron sputtering targets 1High-purity aluminum target, aluminum oxide target, magnetron sputtering targets 2High-purity aluminum target, aluminum oxide target, magnetron sputtering targets 3

Member Information

Suzhou Zhongzhina Semiconductor Technology Co., Ltd.
Country/Region:Jiang Su - China
Business Nature:Manufacturer
Phone:95613164
Contact:spring (Jiangsu Province)
Last Online:17 Feb, 2025