High-Purity Metal Copper (Cu) Target with 99.9999% Purity, Magnetron Sputtering Coating Copper Target in Particle Form, Customizable Size, and Copper Backing Plate Bonding Service

Copper (Cu) Sputtering Target for Vacuum Coating Industry

I. Copper (Cu) Target
As one of the indispensable sputtering targets in the vacuum coating industry, copper targets have established their important position in the high-tech industry due to their excellent performance and wide range of applications. High-purity copper materials, processed through precision manufacturing techniques, are shaped into copper targets of specific sizes and forms. These characteristics not only meet the stringent requirements of vacuum coating technology but also drive the rapid development of multiple cutting-edge fields such as electronics, communications, superconductivity, and aerospace.

Our company specializes in research and development as well as production, creating industry-leading products. We produce single-material targets and electron beam evaporation particle materials as follows:

II. Material Characteristics Analysis
Purity: The core advantage of copper targets lies in their high purity, especially the application of ultra-high-purity copper, which maximizes this advantage. High purity means extremely low impurity content in the copper material, reducing the risk of contamination during the coating process and ensuring high-quality coating layers. High-purity copper targets can provide purer and more uniform coating layers, significantly enhancing the product's conductivity, thermal conductivity, and corrosion resistance. In electronic devices, high-purity copper coatings can reduce resistance and improve signal transmission efficiency; in the field of superconductivity, ultra-high-purity copper is one of the key materials for achieving the superconducting phenomenon.

Density: Copper has a density of approximately 8.96 g/cm³. This moderate density allows copper targets to maintain stable sputtering rates and uniform sputtering distributions during the sputtering process. High density means that more copper atoms can participate in the coating process, increasing the thickness and density of the coating layer. This is particularly important for applications requiring high-thickness, high-strength coatings, such as protective coatings on spacecraft surfaces and interconnect lines in electronic devices.

Melting Point: Copper has a melting point of 1083°C, which is relatively low but sufficient to meet the needs of most vacuum coating processes. During the sputtering coating process, the target needs to withstand the bombardment of high-energy particles to produce the sputtering phenomenon, and the melting point of the copper target ensures its stability during this process, with minimal risk of melting or deformation. This characteristic makes copper targets an ideal choice for preparing high-quality coating layers.

III. Industry Application Advantages
Electronics Field: In the electronics industry, copper targets are widely used in the manufacturing processes of integrated circuits, displays, solar cells, and other products. High-purity copper coatings can reduce resistance, improve current transmission efficiency, and enhance product stability and reliability. Especially in the field of micro-machining, the precise sputtering capability of copper targets makes it possible to prepare high-precision, high-density circuits.

Communications Field: With the rapid development of new-generation communication technologies such as 5G and 6G, the performance requirements for communication equipment are increasingly high. Copper targets demonstrate unique advantages in preparing high-frequency, high-speed transmission lines. High-purity copper coatings can reduce signal attenuation and interference, improving communication quality and rate.

Superconductivity Field: Superconducting materials are key to achieving low-energy consumption and high-efficiency power transmission and storage. As an important component of superconducting materials, high-purity copper targets play a crucial role in preparing superconducting thin films. By precisely controlling the thickness and composition of the coating layer, superconducting performance can be optimized, driving the further development of superconducting technology.

Aerospace Field: In the aerospace field, copper targets are used to prepare protective coatings and special functional thin films. High-purity copper coatings can resist the effects of cosmic radiation and extreme temperature environments, protecting the surface of spacecraft from damage. At the same time, copper targets can be combined with other materials to prepare thin films with special optical, thermal, or electromagnetic properties, meeting the multifunctional needs of spacecraft.

In summary, copper targets occupy an important position in the vacuum coating industry due to their excellent characteristics such as high purity, moderate density, and stable melting point. With the continuous advancement of technology and the continuous expansion of applications, copper targets are bound to exert their unique advantages in more fields, contributing more to the development of human society.

 

Cobalt (Co) Sputtering Targets Overview

Our offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact us for current pricing or for a quote on sputtering targets and other deposition products not listed.

Cobalt (Co) General Information

Cobalt is one of the most widely recognized metals in the world. It has a density of 8.9 g/cc, a melting point of 1,495°C, and a vapor pressure of 10-4 Torr at 1,200°C It is a lustrous, hard metal that is gray in appearance and characteristically ferromagnetic. One of its most popular uses is as a blue pigment found in paint, jewelry, and glass. It is often alloyed with other metals to make engine parts and cutting tools. Its two main vacuum applications are as a ferromagnetic layer in the production of magnetic storage media and as a transitional layer in battery fabrication.

Cobalt (Co) Specifications

Material Type	Cobalt
Symbol	Co
Atomic Weight	58.933195
Atomic Number	27
Color/Appearance	Lustrous, Metallic, Grayish Tinge
Thermal Conductivity	100 W/m.K
Melting Point (°C)	1,495
Coefficient of Thermal Expansion	13.0 x 10-6/K

 

Theoretical Density (g/cc)	8.9
Ferromagnetic	Magnetic Material
Z Ratio	0.343
Sputter	DC
Max Power Density (Watts/Square Inch)	80
Comments	Alloys with W/Ta/Mo.

 

 

 

Aluminum-Cobalt ( AlCo)，Cobalt-Nickel (CoNi)，Cobalt-Iron (CoFe)，Cobalt Chromium, (Co/Cr)

Cobalt Chromium Nickel, (Co/Cr/Ni)

Cobalt Chromium Platinum, (Co/Cr/Pt)

Cobalt Chromium Tantalum, (Co/Cr/Ta)

Cobalt Chromium Tantalum Platinum, (Co/Cr/Ta/Pt)

Cobalt Iron, (Co/Fe)

Cobalt Iron Boron, (Co/Fe/B)

Cobalt Iron Chromium, (Co/Fe/Cr)

Cobalt Iron Zirconium, (Co/Fe/Zr)

Cobalt Nickel, (Co/Ni)

Cobalt Nickel Chromium, (Co/Ni/Cr)

Cobalt Nickel Iron, (Co/Ni/Fe)

Cobalt Niobium Hafnium, (Co/Nb/Hf)

Cobalt Niobium Iron, (Co/Nb/Fe)

Cobalt Niobium Titanium, (Co/Nb/Ti)

Cobalt Platinum, (Co/Pt)

Cobalt Zirconium Niobium, (Co/Zr/Nb)

Cobalt Zirconium Rhodium, (Co/Zr/Rh)

Cobalt Zirconium Tantalum, (Co/Zr/Ta)