The AW-901eR & AW-903eR  single-wafer dry etchers are automated tools designed as a flexible 13.56MHz RF Parallel Plate plasma etching systems for high-volume wafer fabrication. AW-901eR & AW-903eR are in direct response to manufacturer’s concerns for wafer breakage, Uniformity, Uptime, Reliability, and Production-Proven technology

AW-901eR/AW903eR Applications:

Polysilicon Etch

Nitride Etch

Silicon Nitride Etch

Silicides Etch

Silicon Dioxide Etch

Polyimide Etch

Polyimide ILD Etch

LDD Spacer Etch

BCB Etch

Zero Layer Etch

Backside Etch

Pad Etch

Passivation Etch

Oxide/Contact/Via Etch (Down to 0.8um)

Titanium/Tantalum Alloy

Resist/SOG Planarization

Descum

AW-901eR / AW-903eR  Key Features:

Production-proven plasma etching system.

Up to 3%-5% Uniformity.

Frontside and backside isotropic and anisotropic etch.

Process Temperature: 6-65°C .

75mm-150mm wafer capability.

Integrated solid robotic wafer handling. Single wafer process.

Fixed cassette station and wafer aligner/cooling station.

Can handle 50um thickness wafer.

PC controller with Advanced Allwin21 Software.

Endpoint detection with Allwin21 SLOPE technology. (Optional)

Up to 4 gas lines with MFC’s.

MKS 13.56 MHz RF Air-Cooled Generator 300W, 600W, or 1000W.

Pressure control with UPC. Throttle valve is optional.

Touch screen GUI.

EMO, Interlocks, and Watchdog function.

GEM/SECS II (Optional)

Small Footprint

Made in U.S.A.

AW-901eR / AW-903eR   Software Key Features:

Real time graphics display, process data acquisition, and analysis.

Closed-loop process parameters control.

Precise parameters profiles tailored to suit specific process requirements.

Programmable comprehensive calibration of all subsystems from within the software. This allows faster, easier calibration, leading to enhanced process results.

Recipe creation to ensure process repeatability. It features a recipe editor to create and edit recipes to fully automate the processing of wafers inside the process chamber.

Validation of the recipe so improper control sequences will be revealed.

Storage of multiple recipes, process data, and calibration files so that process & calibration results can be maintained or compared over time.

Passwords provide security for the system, recipe editing, diagnostics, calibration, and setup functions.

Simple and easy to use menu screen which allow a process cycle to be easily defined and executed.

Troubleshooting features which allows engineers and service personnel to activate individual subassemblies and functions. More I/O and AD/DA “exposure”.

DB-25F parallel (printer) port.  The computer interfaces to the Allwin21 system with only one cable: the control interface cable.

The control board inside the machine that translates the computer commands to control the machine has a watchdog timer. If this board loses communication with the control software, it will shut down all processes and halt the system until communication is restored.

GEM/SECS II function (Optional).

Advanced Allwin21 Endpoint Detection function (Optional).

AW-901eR / AW-903eR   Specifications:

Up to 6 inch Capability

Throughput: 30-60 WPH, Process Dependent

Temperature: 6-65ºC (±2 ºC) capability

Gas Lines: 4 gas lines with MFCs.

Etcher Rate: AW-901eR: 0-8000A/minute; AW-903eR: 0-4000A/minute, Process Dependent

Uniformity: Up to ±3%, Process Dependent

Particulate: <0.05 /cm2 (0.03um or greater)

Selectivity: 901eR: 2-20:1 ;    AW-903eR: 2-20:1, Process Dependent

MTBF/MTTA/MTTR: 450 Hours/100 Hours/3.5 Hours or Better. 95% uptime

* Contact Allwin21 sales for other applications and specifications

AW-901eR / AW-903eR   Configuration:

Main Frame, Standard

Pentium Class PC with AW Software

Keyboard, Mouse, USB with SW backup, and Cables

Chuck

① 3”;  ② 4”;  ③ 5”;  ④ 6”

Wafer Aligner/Cooling Station

3-Axis Integrated Solid Robot

① H-Zero (Standard);  ② H1-7X10.5 (TTW)

Fixed Cassette Station

Chuck Assembly

① 901eR Non-anodized;   ② 903eR Anodized /W Flat

③ 903eR Anodized /wo Flat ④ 903eR Non-anodized /W Flat

Reactor Assembly

① 901eR Non-anodized;  ② 903eR Anodized

③ 903eR Non-anodized;  ④ 903eR High Performance

⑤ Direct Cooling;        ⑥ Non-Direct Cooling

Pins

① Quartz;  ② Ceramic;  ③ SST

Centering Ring

① Aluminum;  ② Quartz;  ③ Ceramic

Main Control Board

Gas Box /w 4 inline Gas Lines, MFC, filters, and Pneumatic valves

RF Matching Network with PCB

13.56 MHz RF Generator (Air or Water Cooled)

① MKS Elite:300HD;    ② MKS Elite:600HD

③ MKS Elite:1000HD;  ④ ENI ACG 3;  ⑤ ENI ACG 10

AC/DC Box

ATM Sensor

UPC Pressure Control

① 225 SCCM,901eR;  ② 2000 SCCM, 903eR

MKS Baratron with Pneumatic Isolation Valve

Main Vacuum Valves

Front EMO, Interlocks

15-inch Touch Screen GUI

AW-901eR / AW-903eR   Options:

EOP Module with PCB

GEM/SECS II function (Software)

Lamp tower alarm with buzzer

Throttle Valve Pressure Control

Vacuum Pump

Chiller for chuck and chamber

Through The Wall

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