sputtering targets(metal target, alloy target,ceramic target)

sputtering targets(metal target, alloy target,ceramic target)
Model:-
Brand:CRM
Origin:Made In China
Category:Computers & AV Digital / Photographic Apparatus / Other Photographic Apparatus
Label:sputtering target , target , coating material
Price: -
Min. Order:1 pc
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Product Description

coating materials for the applications to magnetic disk and head, magneto optical disk, optical disk, superconducting thin film, protective film.
Purity: 99%, 99.9%,99.95% 99.99%,99.995% 99.999% and 99.9999%.
Shape: foil, sheet, wire, filament, rod, pipe, tube, powder, pellet, shot, wafer, plate, tablet, ingot, chunk, lump, granule, dendritic, crystal, etc.
Dimension: Diameter (<500mm), Length (<1000mm), Width (<500mm), Thickness (>1mm), Custom-Made
High Pure Metal Sputtering Targets or rare earth metal sputtering targets: Lanthanum (La),Cerium (Ce),Praseodymium (Pr), Neodymium (Nd),Samarium (Sm),Europium (Eu),Gadolinium (Gd),Terbium (Tb),Dysprosium (Dy),Holmium (Ho), Erbium (Er) ;Aluminum (Al),Antimony (Sb),Bismuth (Bi),Boron (B),Cadmium (Cd),Carbon (C),Chromium (Cr),Cobalt (Co),Copper (Cu),Germanium (Ge),Gold (Au) ,Graphite (C),Hafnium (Hf) , Indium (In),Iridium (Ir),Iron (Fe),Magnesium (Mg),Manganese (Mn),Molybdenum (Mo),Nickel (Ni),Niobium (Nb) ,Palladium (Pd),Platinum (Pt),Rhenium (Re) ,Ruthenium (Ru),Selenium (Se),Silver (Ag),Silicon (Si),Tantalum (Ta),Tin (Sn),Titanium (Ti),Tungsten (W),Vanadium (V),Zirconium (Zr),Zinc (Zn)
Alloy Sputtering Targets: Aluminum Copper (Al-Cu),Aluminum Silicon (Al-Si),Cerium Gadolinium (Ce-Gd), Aluminum Magnesium(Al-Mg),Aluminum Silver (Al-Ag),Chromium Aluminum (Cr-Al),Cerium Samarium (Ce-Sm),Chromium Silicon (Cr-Si),Cobalt Chromium (Co-Cr),Cobalt Iron (Co-Fe),Cobalt Iron Boron (Co-Fe-B),Copper Gallium (Cu-Ga), Copper Nickel (Cu-Ni),Copper Zirconium (Cu-Zr),In dium Tin (In-Sn),Iridium Manganese (Ir-Mn),Iron Boron (Fe-B), Iridium Rhenium (Ir-Re),Iron Carbon (Fe-C),Molybdenum Silicon (Mo-Si),Nickel-Aluminum (Ni-Al),Nickel-Chromium (Ni-Cr), Nickel-Chromium Silicon (Ni-Cr-Si),Nickel-Iron (Ni-Fe),Nickel-Titanium (Ni-Ti),Nickel-Vanadium (Ni-V),Silver Copper (Ag-Cu),Silver Tin (Ag-Sn), Samarium Cobalt (Sm-Co),Tantalum Aluminum (Ta-Al),Titanium Aluminum (Ti-Al),Titanium Nickel (Ti-Ni),Terbium Dysprosium Iron Alloy (TbDyFe),Terbium Iron Alloy (TbFe),Zirconium Aluminum (Zr-Al),Zirconium Iron (Zr-Fe),Zirconium Nickel (Zr-Ni),Zirconium Niobium (Zr-Nb) ,Zirconium Titanium (Zr-Ti), Zirconium Yttrium (Zr-Y)
Ceramic Sputtering Targets:(Boride Sputtering Targets ,Carbide Sputtering Targets,Fluoride Sputtering Targets,
Nitrides Sputtering Targets ,oxide sputtering targets,Selenides Sputtering Targets,Sulfides Sputtering Targets )

Boride Sputtering Targets

Chromium Boride (Cr2B),Chromium Boride (CrB),Chromium Boride (CrB2),Chromium Boride (Cr5B3), Iron Boride (FeB),Hafnium Boride (HfB2),Lanthanum Boride (LaB6),Molybdenum Boride (Mo2B),Molybdenum Boride (Mo2B5),Niobium Boride (NbB),Niobium Boride (NbB2),Tantalum Boride (TaB),Tantalum Boride (TaB2),Titanium Boride (TiB2),Tungsten Boride (W2B),Tungsten Boride (WB),Vanadium Boride (VB),Vanadium Boride (VB2),Zirconium Boride (ZrB2)

Carbide Sputtering Targets

Boron Carbide (B4C),Chromium Carbide (Cr3C2),Hafnium Carbide (HfC),Molybdenum Carbide (Mo2C),Niobium Carbide (NbC),Silicon Carbide (SiC),Tantalum Carbide (TaC),Titanium Carbide (TiC),Tungsten Carbide (WC),Tungsten Carbide (W2C),Vanadium Carbide (VC),Zirconium Carbide (ZrC)

Fluoride Sputtering Targets

Aluminium Fluoride (AlF3),Barium Fluoride (BaF3),Cadmium Fluoride (CdF2), Calcium Fluoride (CaF2), Cerium Fluoride (CeF3), Dysprosium Fluoride (DyF3),Erbium Fluoride (ErF3) ,Hafnium Fluoride (HfF4),Kalium Fluoride (KF),Lanthanum Fluoride (LaF3)

Lead Fluoride (PbF2),Lithium Fluoride (LiF), Praseodymium Fluoride (PrF3), Magnesium Fluoride (MgF2), Neodymium Fluoride (NdF3), Rare Earth Fluoride (ReF3) ,Samarium Fluoride (SmF3),

Sodium Fluoride (NaF) ,Sodium Aluminum Fluoride (Cryolite) Na3AlF6 ,Strontium Fluoride (SrF2),Thorium Fluoride (ThF4),Yttrium Fluoride (YF3),Ytterbium Fluoride (YbF3)

Nitrides Sputtering Targets

Aluminum Nitride (AlN), Boron Nitride (BN),Gallium Nitirde(GaN), Hafnium Nitride (HfN), Niobium Nitride (NbN), Silicon Nitride (Si3N4), Tantalum Nitride (TaN), Titanium Nitride (TiN), Vanadium Nitride (VN), Zirconium Nitride (ZrN)

Oxide Sputtering Targets

Aluminum Oxide (Al2O3), Antimony Oxide (Sb2O3),Antimony Tin Oxide (ATO),Barium Titanate (BaTiO3),Bismuth Oxide (Bi2O3),Cerium Oxide (CeO2),Copper Oxide (CuO),Chromium Oxide (Cr2O3) ,Dysprosium Oxide (Dy2O3),Erbium Oxide (Er2O3),Europium Oxide (Eu2O3),Gadolinium Oxide (Gd2O3),Gallium Oxide (Ga2O3),Germanium Oxide (GeO2),Hafnium Oxide (HfO2) ,Holmium Oxide (Ho2O3),Indium Oxide (In2O3),Indium Tin Oxide (ITO) ,Iron Oxide (Fe2O3) ,Iron Oxide (Fe3O4),Lanthanum Oxide (La2O3),Lead Titanate (PbTiO3),Lead Zirconate (Pb ZrO3),Lithium Niobate (LiNbO3), Lutetium Iron Oxide (Lu3Fe5O12),Lutetium Oxide (Lu2O3),Magnesium Oxide (MgO),Molybdenum Oxide (MoO3),Neodymium Oxide (Nd2O3),Praseodymium Oxide (Pr6O11),Praseodymium Titanate (Pr(TiO2)2),Praseodymium Oxide (Pr2O3),Samarium Oxide (Sm2O3),Scandium Oxide (Sc2O3),Silicon Dioxide (SiO2),Silicon Monoxide (SiO),Strontium Titanate (SrTiO3),Strontium Zirconate (SrZrO3),Tantalum Pentoxide (Ta2O5),Terbium Oxide (Tb4O7),Tellurium Oxide (TeO2),Thorium Oxide (ThO2),Thulium Oxide (Tm2O3),Titanium Dioxide (TiO2),Titanium Monoxide (TiO),Titanium Pentoxide (Ti3O5),Titanium Trioxide (Ti2O3),Tin Dioxide (SnO2),Tin Monoxide (SnO),Tungsten oxide (WO3),Vanadium Pentoxide (V2O5),Yttrium Aluminum Oxide (YAG)Y3Al5O12,Ytterbium Oxide (Yb2O3),Yttrium Oxide (Y2O3),Zinc Oxide (ZnO),Zinc Aluminum Oxide (ZnO:Al),Zirconium Oxide (ZrO2) (unstabilized),Zirconium Oxide (ZrO2-5-15wt%CaO)

Selenides Sputtering Targets

Bismuth Selenide (Bi2Se3),Cadmium Selenide (CdSe),Indium Selenide (In2Se3),Lead Selenide (PbSe),Molybdenum Selenide (MoSe2),Niobium Selenide (NbSe2),Tantalum Selenide (TaSe2),Tungsten Selenide (WSe2),Zinc Selenide (ZnSe)

Silicides Sputtering Targets

Chromium Silicide (Cr3Si),Chromium Silicide (CrSi2),Cobalt Silicide(CoSi2), Hafnium Silicide (HfSi2),Molybdenum Silicide (MoSi2),Niobium Silicide (NbSi2),Tantalum Silicide (TaSi2),Tantalum Silicide (Ta5Si3),Titanium Silicide (TiSi2),Titanium Silicide (Ti5Si3),Tungsten Silicide (WSi2),Vanadium Silicide (V3Si),Vanadium Silicide (VSi2),Zirconium Silicide (ZrSi2)

Sulfides Sputtering Targets

Antimony Sulfide (Sb2S3) ,Arsenic Sulfide (As2S3),Cadmium Sulphide ( CdS),Iron Sulfide (FeS),Lead Sulfide (PbS),Molybdenum Sulfide (MoS2),Niobium Sulfide (NbS1.75),Tantalum Sulfide (TaS2),Tungsten Sulfide(WS2),Zinc Sulphide (ZnS),

Tellurides Sputtering Targets

Cadmium Telluride (CdTe),Lead Telluride (PbTe),Molydenum Telluride (MoTe2),Niobium Telluride (NbTe2),Tantalum Telluride (TaTe2),Tungsten Telluride (WTe2),Zinc Telluride (ZnTe)

Other

Cr-SiO,

sputtering targets(metal target, alloy target,ceramic target) 1sputtering targets(metal target, alloy target,ceramic target) 2sputtering targets(metal target, alloy target,ceramic target) 3

Member Information

China Rare Metal Material Co., Limited
Country/Region:China
Business Nature:Manufacturer
Phone:13317053312
Contact:Minna Shu (manager)
Last Online:16 Dec, 2019