Application

DR-JTGKM10 crystalline silicon laser edge etching system uses high-energy laser beam to cut off short circuit resistance in the edge of the of silicon cells, and makes it to infinity, as a result, the optic-electro conversion efficiency improves greatly. 

Functions

It can engrave lines on solar cell coating layer, and suits for coated layers of different materials. Laser control and carved film software have the functions of automatic adjust carving film depth; entire computer input and output; WINDOWS-based interface enabling arbitrary graphical engraving. It has high precision servo system and high precision focusing system. All-in-use built-in design and highly integrated optical and mechanical devices provides high peak power and the best beam quality. 

Features

Clear the edge short circuit resistance to infinity, improving cell conversion efficiency;

End-pumped solid-state lasers;

Long laser life, long-term maintenance-free;

High edge etching efficiency (600-900 pieces / hour)

Automatic up and down shaking, CCD positioning