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 PECVD Plasma Enhanced Chemical Vapor Deposition Tube Furnace System 1
  •  PECVD Plasma Enhanced Chemical Vapor Deposition Tube Furnace System 1

PECVD Plasma Enhanced Chemical Vapor Deposition Tube Furnace System

Model:PT PECVD
Brand:Protech
Origin:Made In China
Category:Electronics & Electricity / Other Electrical & Electronic
Label:PECVD , PECVD furnace , furnace
Price: US $4000 / pc
Min. Order:1 pc
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Detail

Product Description

PT-O1200-4C-PECVD is a compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, 

which consists of 500W RF plasma source, 3.14" O.D split tube furnace, 4 channels precision mass flow meter with gas 

mixing tank, and high quality mechanical pump. 

Preparation of nano materials 

Preparation of nano materials

Preparation of nano materials

Passivation of semiconductor devices and integrated circuits

 

Features:

Reaction pipe clean pollution-free

Plasma generator power(0-500W adjustable)

Over-temperature alarm multiple protection

Can input N2,Ar2 and other gases

Highly automated control can save manpower cost unattended.

 

Model

PT-O1200-4CPECVD

Tube Furnace

Display

LED

 

Max. Temperature

1200℃

 

Continuous Woking Temp.

≤1100℃

 

Heating Rate

0~20℃/min

 

Temperature Zone

Single

 

Accuracy

±1℃

 

Tube Size

Φ80*1200mm

 

Temperature Control

PID automatic control via SCR power control

 

Heating curves

30 steps programmable

 

Heating zone

440mm

 

constant heating zone

150mm

 

Power

220V, 50 Hz, single phase at max. 4KW

Plasma RF Power 
supply 

Output Power

5 -500W adjustable with ± 1% stability

 

RF frequency

13.56 MHz ±0.005% stability

 

Reflection Power

200W max.

 

Matching

Automatic

 

RF Output Port

50 Ω, N-type, female

 

Noise

<50 dB. 

 

Cooling

Air cooling.

 

Power 

220V, 50Hz

Anti-corrosive Pressure Gauge

3.8x10-5 to 1125 Torr measurement range

Anti-corrosive, gas-type independent 

Vacuum Pump and valve

Heavy Duty Rotary Vane Vacuum Pump with max. vacuum pressure 10-2 torr.

KFD25 adapter and stainless steel pipe are connected between pump and tube flange with precision ball valve

Digital vacuum pressure gauge and display are installed with the furnace

Mass Flow meters

Four precision mass flow meters :

MFC 1: Gas flow range from 0~100 sccm

MFC 2&3: Control range from 0~200 sccm  

MFC 4: Control range from 0~500 sccm

One gas mixing tank is installed on bottom case with liquid release valve

4 stainless steel needle valves is installed on left side of bottom case to control 4type gases mixing manually

Gas inlet fitting: four 1/4NPS

Gas outlet fitting: four 1/4NPS


Product Image

 PECVD Plasma Enhanced Chemical Vapor Deposition Tube Furnace System 1
Img 1

Send Inquiry to this Member

Zhengzhou Protech Mechanical Equipment Co.,Ltd.

Room 511,No.12 Dongqing street,High-tech zone,Zhengzhou,China

Phone:
86-371-56763132
Fax:
86-371-67103035
Contact:
Anna Liu (Sales)
Mobile:
37195605

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