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Dual-target magnetron sputtering coater (with RF&DC power supply)  is a cost-effective vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable.

• There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. 
• The device is equipped with a 500W DC power supply and a 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal. The two targets can meet the needs of multi-layer or multiple coatings.
• The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements.
• The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency.
• This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Application:Dual-target RF DC magnetron co-sputtering 

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory