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Three targets magnetron sputtering coater (with DC&RF power supply) CY-MSP300S-2DC1RF is a cost-effective laboratory vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable.

• There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
• the device is equipped with 500W DC power supply and 300W RF power supply. The DC power supply can be used for the preparation of metal film, and the RF power supply can be used for the preparation of non-metal films. The three targets can meet the needs of multi-layer or multiple coatings. 
• The PVD coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.
• This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Application:3-target RF DC magnetron sputtering coater 

This PVD device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.