| Model: | - |
|---|---|
| Brand: | chen li |
| Origin: | Made In China |
| Category: | Industrial Supplies / Electrical & Electronic Product Equipment |
| Label: | Annealing furnace , Heat treatment furna , Diffusion furnace |
| Price: |
¥220000
/ pc
|
| Min. Order: | 1 pc |
| Last Online:04 Feb, 2025 |
Purpose:
The high vacuum annealing furnace is used for alloy, oxidation, annealing, sintering, diffusion and other processes of 6-inch silicon wafers in large-scale integrated circuit and MEMS production lines. It can also be used for sinking processes to complete the corresponding processes of 4-inch wafers.
1、 Equipment structure:
1. Operation mode: Left (right) hand operation mode
2. Silicon wafer size: 6-inch circular wafer
3. Process layout: meet customer process requirements
4. Automation level: Industrial computer control system automatically controls the process flow
5. Delivery and pickup method: manual entry and exit of the boat.
6. Appearance: One main unit, with a horizontal two tube main frame.
2、 Main technical parameters:
1. Effective diameter of heating furnace tube: suitable for 6-inch silicon wafers. It is compatible with 5-inch and 4-inch silicon wafers downwards.
2. Working temperature range: 200~800 ℃
3. Constant temperature zone length and accuracy: 600mm,
4. Control mode: Unified process management by industrial computer
5. Vacuum degree: 2 * 10-4 Pa
