ITO靶材/粉体 ITO target/Powder

产品说明Product description

ITO靶材是铟锡氧化物功能陶瓷材料，主要用于磁控溅射靶材制备ITO导电薄膜。采用先进的常压烧结工艺，多个靶管/靶块拼接贴合为ITO靶材成品。

ITO target is a functional indium tin oxide ceramic material, which is used for deposition of ITO transparent conductive thin films with magnetron sputtering. It is produced by using the classic ceramic process at ambient pressure, in the form of tube/planar segments that are bonded into ITO target.

 

ITO旋转靶/平面靶Rotary /Planar ITO target

组分Chemical composition (wt%)	In2O3:SnO2 = 90:10
纯度 Purity (%)	≥99.99
密度 Density (g/cm3)	≥7.13
相对密度 Relative density (%)	≥99.5
电阻率 Electrical resistivity (Ω∙cm)	≤1.2×10-4

 

应用领域Applications

 

-导电玻璃Conductive glasses

-TFT-LCD, OLED, 触摸屏Touch panel screens

-太阳能电池Solar cells

 

ITO 粉体/低密度靶 ITO powder/low density target

 

应用领域Applications

 

-蒸镀制备透明导电薄膜 Vapor deposition of transparent and conductive thin films

-防紫外，防辐射涂料 Anti-UV, anti-radiation coatings

 

产品特点Product features:

-采用专业技术生产的ITO粉体，烧结密度高，微结构均匀。

ITO powder is self-produced using our own patent technology, with high sintered density and homogeneous microstructure.

-具有导电导热性好，强度高等优点，减少结瘤现象和微电弧的出现。

High electrical and thermal conductivities, excellent mechanical property to minimize the formation of noddles and micro arc.

 

靶材尺寸Dimension

 

-旋转靶每节长度(Length of segment): 200-300 mm

-平面靶单节规格(Dimension of planar segment) 400×400 mm2

-按图纸要求加工(According to customized drawings)