| Model and MainTechnical Parameters of VAKIA-EDC Series Vacuum Optical Coating Machine |
| Performance/Model |
VAKIA-OEC-900 |
VAKIA-OEC -1200 |
VAKIA-OEC -1350 |
| Size of vacuum chamber |
φ 900*H1050mm |
φ 1200*H1250mm |
φ 1350*H1450mm |
| Frock clamp |
Arch single workpiece disc, maximally meeting customers’ requirement on evenness, rotation: 5-30 r/min, stepless variable speed |
1. Arch single workpiece disc, maximally meeting customers’ requirement on evenness, rotation: 530r/min, stepless variable speed
2. Arch three-workpiece disc, planetary revolution and autorotation, meeting customers’ requirement on production amount, rotation: 5-30r/min, stepless variable speed |
| Vacuum system |
Diffusion pump KT-600, Roots pump ZJ-300, mechanical pump 2X-70, rotary pump 2X-8, 304 stainless steel piping |
Diffusion pump KT-800, Roots pump ZJ-600, mechanical pump 2X-70, rotary pump 2X-8, 304 stainless steel piping |
Diffusion pump KT-800, Roots pump ZJ-600, mechanical pump 2X-70, rotary pump 2X-25, 304 stainless steel piping |
| unlimited vacuum: Superior to 6*10 -4 Pa |
| Equipped with anti-turbulence device, safe interlock design, optional manual or automatic |
| Heating system |
Heating mode of heating tube, PID control, maximum: 350° C± 1.5° C |
| Working gas gassing |
Gas mass controller or manual fine tuning gas filling valve |
| Vacuum ion bombardment |
DC 3KV, 0.6KW rod cathode (for automatically cleaning workpieces before coating) and optional gas ion source |
| Evaporation source (optional) |
1. Electron gun: 6KW, high voltage 4KV-10KV, adjustable. Positioning scanning, triangular wave scanning, circular scanning, spiral scanning, square wave scanning, sine wave, good beam spot focusing, high positioning precision and good scan reproducibility |
| 2. Crucible: Six-hole Φ 38*20 crucible or four-hole Φ 38*20 plus arc crucible with hole center arc length of 87 (for evaporation materials with large consumption and low melting point) or hole Φ 48*18 crucible |
| Ion source (optional) |
1.5KVA Hall ion source is used for cleaning before electroplating or assisted plating in electroplating process, and favorable for improvement of film refractive index, firmness, compactness and adhesion. |
| Coating control system (optional) |
1. Crystal controller: Store 1-99 layer automatic coating process, 99 types of program data, precision: 0.5$+1A fixed error. |
| 2. Light controller adopts multi-wavelength full spectrum end point analysis technology, determines film by analyzing monitoring chip 370-870mm refractive index (or reflective rate) curve, has high control precision and can also adopt single wavelength control, automatic control and manual control. The additional MACILEOD film calculation software has high integration degree. |
| 3. Light controller matches the crystal controller to meet coating requirements of high precision and high repeatability, and upper computer to realize automatic control. |
| 4. Domestic light controller: Wavelength 330-870, adjustable, precision: ± 1.5NM. |
