Metal Alloy Sputtering Target

 The metal alloy sputtering targets XK produced are including Nickel Alloy Sputtering Targets, Iron Alloy Sputtering Targets, Cobalt Alloy Sputtering Targets, Copper Alloy Sputtering Targets and Aluminium Alloy Sputtering Targets, with purities from 99.9% to 99.999%, desired at%-wt% distribution and dimension exactly according to your drawing, to meet every customer’s specific requirements.

Nickel Alloy Sputtering Targets

Product Name	Element Symbol	purity	shape	detail
Nickel Alloy Sputtering Targets
Nickel Chromium Sputtering Target	Ni + Cr	3N, 3N6, 4N	Planar target, Rotary target	view details
Nickel Iron Sputtering Target	Ni + Fe	3N5, 4N	Planar target	view details
Nickel Vanadium Sputtering Target	Ni + V	3N, 3N6, 4N	Planar target, Rotary target	view details

Iron Alloy Sputtering Targets

Product Name	Element Symbol	purity	shape	detail
Iron Alloy Sputtering Targets
Iron Cobalt Sputtering Target	Fe + Co	3N, 3N6, 4N	Planar target, Rotary target	view details
FeCoTaZr Sputtering Target	Fe + Co + Ta + Zr	3N5	Planar target	view details

Cobalt Alloy Sputtering Targets

Product Name	Element Symbol	purity	shape	detail
Cobalt Alloy Sputtering Targets
CoTaZr sputtering target	Co + Ta + Zr	3N, 3N5	Planar target	view details

Copper Alloy Sputtering Targets

Product Name	Element Symbol	purity	shape	detail
Copper Alloy Sputtering Targets
Copper Gallium Sputtering Target	Cu + Ga	4N, 5N	Planar target, Rotary target	view details
Copper Indium Gallium Sputtering Target	Cu + In +Ga	4N, 5N	Planar target, Rotary target	view details
Copper Indium Sputtering Target	Cu + In	4N, 5N	Planar target, Rotary target	view details

Aluminium Alloy Sputtering Targets

Product Name	Element Symbol	purity	shape	detail
Aluminium Alloy Sputtering Target
Titanium Aluminum Sputtering Target	Ti + Al	2N5, 3N	Planar target	view details

Other Alloy Sputtering Targets

Product Name	Element Symbol	purity	shape	detail
Other Alloy Sputtering Targets

 

Pure Metal Sputtering Targets

Changsha Xinkang Advanced Materials Co.,Ltd  produce a wide range of high purity Metal sputtering target – with purities of up to 99.9999%, and dimension exactly according to your drawing. Once we get your inquire with full details on the material, purity, dimensions, any special tolerances and the quantity required, our sales engineer will contact with you immediately.

Pure Metal Sputtering Targets List

Product Name	Element Symbol	purity	shape	detail
Germanium Sputtering Target	Ge	99.999	Round, rectangle	view details
Silicon Sputtering Target	Si	4N, 5N, 6N	Planar, Rotary	view details
Gold Sputtering Target	Au	99.99%	Round, rectangle, pellets	view details
Silver sputtering target	Ag	4N, 4N5, 5N	Planar target, Rotary target	view details
Cobalt Sputtering Target	Co	3N5	Planar target, Rotary target	view details
Aluminum Sputtering Target	Al	3N5, 4N, 4N6, 5N, 6N	Planar target, Rotary target	view details
Copper Sputtering Target	Cu	4N, 5N, 6N	Planar target, Rotary target	view details
Nickel Sputtering Target	Ni	3N, 3N6, 4N, 4N5, 5N	Planar target, Rotary target	view details
Rhenium Sputtering Target	Re	3N5	Planar target	view details
Iron Sputtering Target	Fe	3N, 3N5, 4N	Planar target, Rotary target	view details
Titanium Sputtering Target	Ti	3N, 4N, 4N5, 5N	Planar target, Rotary target	view details
Vanadium Sputtering Target	V	2N5, 3N	Planar target, Rotary target	view details
Tungsten Sputtering Target	W	3N5	Planar target, Rotary target	view details
Molybdenum Sputtering Targets	Mo	3N5	Planar target, Rotary target	view details
Tantalum Sputtering Target	Ta	3N5, 4N	Planar target, Rotary target	view details
Niobium Sputtering Target	Nb	3N, 3N5, 4

 

Evaporation Materials

Evaporation Pellets & Pieces

Metal thin films are characterized by high reflectivity, cut-off band width, good neutrality, low polarization effects and other advantages. Therefore, they play an important role in the design of film systems for special applications. Our evaporation materials can be used to obtain the most stringent quality film. We offer complete  high purity metals evaporation materials with various shapes, no matter for R&D or mass production. Our regular evaporation materials are listed in below form, if your desired materials is not included, pls contact our sales engineers for customized service. 
  

Material	Purity	Melting Point	Evaporation Source	Specifications	Application
Ag	4N	962℃	EB	Pellets, Pieces	HR coating
Ti	4N,4N5	1668℃	B	Pellets, Pieces	HR coating Protected coating
Ni	4N,4N5,5N	1453℃	B	Pellets, Pieces	HR coating Protected coating
V	3N	1890℃	EB	Pellets, Pieces	Cold light coating Protected coating
Cr	3N5,4N	1890℃	EB	Pieces	Decoration coating
Al	4N,5N,6N	660℃	B	Pellets, Pieces	Cold light coating HR coating
Cu	4N,5N,6N	1083℃	EB	Pellets, Pieces	Cold light coating Protected coating
Ta	3N5,4N	2996℃	EB	Pellets, Pieces	Protected coating

Evaporation Starter Slug & Crucibles

We produce many accessories for deposition equipment, including slug starter and crucible with a variety of metal materials and dimensions, these high-quality material is designed for thermal evaporation and electron beam evaporation. Benefiting from vast stock, we can promise a earliest delivery for regular specifications. Moreover, all of our products are cleaned and vacuum packed before shipment, so that our customers can use it immediately.  

Product Name	Material	Purity	Melting Point	Regular Size
Starter Slug	Ti	4N,4N5	1668℃	4cc - Top Dia 0.885"  x  Height 0.595" 7cc - Top Dia 1.167"  x  Height 0.563" 15cc - Top Dia 1.480"  x  Height 0.670" 25cc - Top Dia 1.850"  x  Height 0.680" 40cc - Top Dia 2.030"  x  Height 1.020"
Starter Slug	Al	4N,5N,6N	660℃
Starter Slug	Ni	4N,4N5,5N	1453℃
Starter Slug	V	3N	1890℃
Starter Slug	Cr	3N5,4N	1890℃
Crucibles	Cu	4N~6N	1083℃	4cc - Top Dia 0.885"  x  Height 0.595" 7cc - Top Dia 1.167"  x  Height 0.563" 15cc - Top Dia 1.480"  x  Height 0.670" 25cc - Top Dia 1.850"  x  Height 0.680" 40cc - Top Dia 2.030"  x  Height 1.020"
Crucibles	Ta	3N5	2996℃
Crucibles	Nb	3N5	2468℃
Crucibles	W	3N5	3410℃
Crucibles	Mo	3N5	2617℃

 

Compound Sputtering Targets

XK supply high quality Indium tin oxide ITO targets, zinc oxide ZnO target, 2% zinc oxide doped with aluminium oxide AZO target,
titanium oxide TiOX target, niobium oxide NbOX target, monocrystal and polycrystal Silicon target, and IZO, GZO, IGZO targets as well.
We usually adopt sintering technology to produce these above targets for planar and tube shapes, while spraying technology for monoblock rotary targets, the length can be up to 4000mm. Our targets have such characteristics:  uniform color, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants.Pls check the specifications as following form.

ITO, AZO, ZnO targets

Target Name	Purity	Materials	Shape	Dimension	Properties	Application
ITO	99.99%	In2O3: SnO2 =90:10 wt%	Planar	300×600mm max	Relativedensity≥99.3%,            bulk resistivity＜1.7×10-4Ω.cm	FPD, touch panel, LED and solar cells industry
			Rotary	250mm length for each piece
AZO/ZnO	99.99%	ZnO or Al2O3 doped ZnO	Planar	300×600mm max	Relative density≥99%, bulk resistivity＜2~8×10-4Ω.cm	Solar cells and energy saving building glass
			Rotary	Φ130~180×6~8 ×250mm length
IZO	99.95%	As per you request	Planar	As per your request	Relative density≥98%, bulk resistivity＜2×10-3Ω.cm	Solar cells industry
GZO	99.99%	Ga2O3:ZnO= 1~4:99~96wt%	Planar	As per your request	Relative density≥99%, bulk resistivity＜1~2×10-3Ω.cm	Solar cells industry
IGZO	99.99%	In2O3:Ga2O3:ZnO= 1:1:1 or 1:1:2 (mol)	Planar	As per your request	Relative density≥96%, bulk resistivity＜1×10-2~1×10-3Ω.cm	AMOLED,oxide semiconductor TFT
TiOX Titanium oxide	99.95%	TiOX	Planar	As per your request	Relative density≥96%, bulk resistivity＜1×10-2~1×10-3Ω.cm	Solar cells industry
			Rotary
Nb2OX Niobium oxide	99.99%	Nb2OX	Planar	300×600mm max	Relative density≥98%,  bulk resistivity＜1×10-2Ω.cm	PDP, touch panel and optical application industry
	99.80%	Nb2OX	Rotary	Max 13mm thickness, max 4000mm length	Relative density≥95%
Monocrystal &polycrystal Silicon	99.999%	Si	Planar	300*150*(3~12)mm	Straight pull or casting	LCD transparent conducting glass, LOW-E building  glass and micro-electronics
			Rotary	Max 13mm thickness, max 4000mm length	Hot Spray

We also supply various of compound targets which be bonded onto copper backing plate for R&D experiment. We can
guarantee their quality, and offer you very competitive price and prompt delivery , pls email us your specification to get offers.                                                                                                              

Compound targets

Target Name	Materials	Purity	Shape
Aluminum Oxide	Al2O3	99.99%	Disc, rectangular
Barium Titanate	BaTiO3	99.99%	Disc, rectangular
Hafnium Oxide	HfO2	99.99%	Disc, rectangular
Molybdenum Oxide	MO3	99.90%	Disc, rectangular
Nickel Oxide	NiO	99.90%	Disc, rectangular
Silicon Dioxide	SiO2	99.99%	Disc, rectangular
Tungsten Trioxide	WO3	99.90%	Disc, rectangular
Boron Nitride	BN	99.50%	Disc, rectangular
Silicon Nitride	Si3N4	99.50%	Disc, rectangular
Titanium Nitride	TiN	99.50%	Disc, rectangular
Tungsten Carbide	WC	99.50%	Disc, rectangular