laboratory vacuum PVD 3-target RF magnetron sputtering coater with UPS

Model:	MSP325S-3RF-D
Brand:	CYKY
Origin:	Made In China
Category:	Electronics & Electricity / Electronic Instrument / Laboratory Instrument
Label:	magnetron sputtering , vacuum PVD , RF sputtering
Price:	-
Min. Order:	1 pc

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Product Description

CY-MSP325S-3RF-D RF three target magnetron sputtering coater is a cost-effective vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.

Technical parameter

Supply Voltage	VAC 220, 60Hz
UPS	20KVA 16KW, 1 hour delay 16 batteries, with capacity of 38AH
Vacuum Chamber	Dimension: Dia. 325 mm * H 385 mm Material: 304 stainless steel Viewport (Window): ~4'' (100mm) with shutter
Sample Stage	Top sample holder Sample table: Dia. 150mm Sample size: Max. 4'' diameter Rotary speed: 0-40rpm adjustable Heating temperature: up to 700oC
Water Chiller	Water flow rate: 2.3m3/h Power: 3P Cooling Capacity: 8250Kcal/h Compressor output power: 2.25KW
Magnetron Sputtering Gun	3× 2'' magnetron sputter guns, with automatic shutter Sputtering orientation upwards Target diameter: 2'' Magnets: rare earth magnet
RF Generator	3 × RF 300W power supply with auto match Power output range: 5W~300W Maximum reflected power: 100W Power stability: ±0.1% Harmonic component: ≤-50dbc Power supply: Single phase 187-253 VAC, 50/60HZ Efficiency: ≥70% Power factor: ≥90% Reflected power (at maximum power): <3W Maximum load current: 30ARMS Maximum load voltage: 7500VRMS RF output connector: 50 Ω, L29 or customized Match time: 1~3s Real part range of matched impedance: 0~80Ω Imaginary part range of matched impedance:﹣200j~ ﹢200j Cooling method: forced cooling
Mass Flow Meter	3 × MFC mass flow control (Ar, O2 and N2) Measuring ranges: up to 20sccm With pneumatic isolation valve(s) and filter.
Full Automatic control by PC or PLC, to control	Store for minimum 100 recipe 19'' Flat controller