Three targets DC magnetron sputtering coater CY-MSP300S-3DC is a cost-effective laboratory vacuum PVD coating equipment independently developed by our company. It is standardized, modular and customizable.

• There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated.
• The device is equipped with 500W DC power supply. The DC power supply can be used for the preparation of metal film. The three targets can meet the needs of multi-layer or multiple coatings. If customers have other coating needs, DC power supply and pulse power supply can be customized. Various types of power supply are available from 300W to 1000W in various specifications.
• The coating machine has a two-channel high precision mass flow meter. If customers have other requirements, the gas channel of up to four-channel mass flow meter can be customized to meet the complex gas environment requirements. The instrument is equipped with advanced turbo molecular pump group, and ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase.
• This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.

Application:3-target DC magnetron sputtering coater 

This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, this three targets magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.