Equipment: 

1)Mainly used for textured etching and cleaning of single or polycrystalline silicon solar cell before production and diffusion .

2)Process: feeding, corrosion of HF+HNO3 → QDR+N2 bubbling+spray→ KOH corrosion + QDR+N2 bubbling +spray  →HCI corrosion → QDR+N2 bubbling+ spray , blanking, centrifugal drying(offline)

3)This equipment moved using Longmen  manipulator, the processing time can be adjusted freely. Acid-base tank with automatic infusion device can realize continuous production and can display the temperature curve,concentration curve, and each station working state. Has the alarm description, alarm history query function. The resistivity monitoring device for cleaning water. Can store more than 10 process schemes;

4) Yield under standard process: silicon 125mm × 125mm,156mm × 156mm, 210mm × 210mm, suitable for the production of the thickness is 160 ± 30 to 200 ± 30 micron silicon,  production capacity of silicon wafer not less than 1200 pieces / hour.