High-Purity Precious Metal Osmium Target (Os), Magnetron Sputtering Coating Osmium Target, Osmium Target (Osmium, Os), Osmium PVD Coating Material

Product Name: Osmium Target, Osmium Granules, Osmium Powder, Osmium Wire
Grade Specification: Os 1
Application: Mainly used for resistors, relays, spark plug electrodes, electrical contacts, thermocouples, and printed circuits, etc.

Product Details:
Precious metal osmium and its alloys are primarily used as catalysts in the petrochemical industry.
In the electronics and electrical industry, they are used for resistors, relays, spark plug electrodes, electrical contacts, thermocouples, and printed circuits, etc.
In the glass industry, osmium metal does not contaminate molten glass and can be used as a lining for containers when manufacturing optical glass.
Osmium-iridium alloys can be used as bearings in watches and instruments, and for manufacturing pen tips and stylus needles.
Traditionally, osmium was used to make pen tips, and now it is applied in the production of magnetron sputtering coating targets.

Osmium Sputtering Target (Osmium, Os)
Shape: Round, Square
Size: Φ50~100mm
Thickness: 3~15mm
Purity: ≥3N5
Note: Other sizes can be made according to customer requirements. Please contact sales for specific sizes.

High-purity rare metal rhenium target, magnetron sputtering target, Rhenium (Re), rhenium-tungsten, rhenium-molybdenum alloy target plate, PVD coating material.

Product Name: Rhenium Target (Re)
Grade Specification: Re1
Application: Mainly used as electrode material under high-temperature and harsh conditions, and for the manufacture of components in aerospace equipment.

Product Details:
Rhenium is a silver-colored metal. Due to its high price, its applications are limited. It can be used for magnetron sputtering, commonly available in the form of rhenium plates, crucibles, particles, and wires. Rhenium alloys include tungsten-rhenium alloy (W-Re) and molybdenum-rhenium alloy (Mo-Re). Due to their excellent high-temperature strength and plasticity, various structural components, heaters, and special-shaped parts made from these alloys are widely used in aerospace, nuclear energy, ultra-high-temperature alloys, semiconductor magnetron sputtering, high-temperature thermal fields, and other industries.

Rhenium Sputtering Target (Re)
Shape: Round, sheet, crucible, particle, wire
Size: Customized according to requirements
Thickness: Customized as required
Purity: ≥4N
Note: Other sizes can be made according to customer requirements. Please contact sales for specific dimensions.

High-purity precious metal Ruthenium (Ru) magnetron sputtering coating deposition target, PVD coating material with evaporated particles, customizable size for scientific research experiments.

Product Name: Ruthenium (Ruthenium - Ru) Sputtering Target
Grade Specification: Ru2
Application Notes: Ruthenium thin films, due to their unique physical, chemical, and catalytic properties, are widely used in electronics, electrical engineering, and catalysis fields, such as interlayer in perpendicular magnetic recording media, copper diffusion barriers in large-scale integrated circuits, etc.

Product Details:
Precious metal ruthenium thin films, owing to their distinct physical, chemical, and catalytic properties, find extensive applications in electronics, electrical engineering, and catalysis, including as interlayers in perpendicular magnetic recording media and copper diffusion barriers in large-scale integrated circuits. Our company possesses comprehensive target processing, quality control, and spent target recycling technologies, enabling us to produce high-quality, large-size ruthenium (Ru) sputtering targets tailored to meet diverse customer needs.

Specifications and Dimensions:
Shape: Circular, Square
Size: Φ10~200mm
Thickness: 3~15mm
Purity: 4N
Note: Other sizes can be made according to customer requirements.