Titanium Carbide (TiC)
Titanium Carbide (TiC), also known as Titanium Carbide, serves as a high-performance magnetron sputtering target material, demonstrating extensive application prospects and unique advantages in the fields of materials science and engineering. Below is a detailed introduction to the b , physical properties, and industrial application advantages of titanium carbide target materials. Our company focuses on technology research and development as well as production, striving to create industry excellence. Our company produces the following carbide target materials:

CARBIDES
Aluminum Carbide (Al4C3) Tantalum Carbide (TaC)
Boron Carbide (B4C) Titanium Carbide (TiC)
Chromium Carbide (Cr3C2) Tungsten-Cobalt Carbide (WC-Co)
Hafnium Carbide (HfC) Tungsten Carbide (WC)
Molybdenum Carbide (Mo2C) Vanadium Carbide (VC)
Niobium Carbide (NbC) Zirconium Carbide (ZrC)

Basic Introduction
Titanium carbide target material is a compound composed of titanium and carbon elements, with a chemical formula of TiC and a molecular weight of 59.89. This material typically exists in the form of gray metallic powder or blocks, featuring a cubic crystal structure. Titanium carbide targets are prepared through processes such as atmospheric sintering, reactive sintering, and hot isostatic pressing (HIP), with strict control over the purity and composition of raw materials, as well as the design dimensions of the shaped blanks. After precision machining, the blanks become targets. Furthermore, titanium carbide targets can be custom-processed with specific doping ratios according to customer requirements.

Physical Properties

Purity: The purity of titanium carbide targets can typically reach over 99.9%, ensuring the quality and performance of the coatings.

Density: The density of titanium carbide is 4.93 g/cm³ (measured at 25℃), which contributes to the stability and uniformity of the target material during the magnetron sputtering process.

Melting Point: With a high melting point of 3140℃, titanium carbide maintains its physical and chemical stability in high-temperature environments.

Hardness: The hardness of titanium carbide is extremely high, second only to diamond, making it an ideal wear-resistant material.

Chemical Composition: Composed of titanium and carbon elements, titanium carbide features a unique crystal structure where titanium and carbon are bonded through ionic, covalent, and metallic bonds. This special bonding structure endows titanium carbide with many unique properties.

Industry Application Advantages

High-Performance Coatings: During the magnetron sputtering process, titanium carbide targets can form high-quality, high-hardness coating layers. These coating layers exhibit excellent wear resistance, corrosion resistance, and high electrical conductivity, making them widely used in high-strength applications such as cutting tools, bearings, and more.

High-Temperature Stability: The high-temperature stability of titanium carbide targets enables their wide application in fields such as high-temperature thermal barrier coatings, high-temperature ceramics, and refractory materials. These materials can maintain their physical and chemical stability in high-temperature environments, thereby enhancing the reliability and service life of equipment.

Chemical Stability: Titanium carbide targets possess good chemical stability and can resist many common chemical corrosions, including acids, alkalis, and some organic solvents. Therefore, they are suitable for preparing corrosion-resistant coatings, anti-corrosion materials, and chemical catalysts.

Customization Services: The customization services for titanium carbide targets allow customers to adjust the purity, doping ratios, and specifications of the targets according to specific needs. This flexibility enables titanium carbide targets to meet the special requirements for material properties in different application fields.

Wide Range of Applications: In addition to the aforementioned applications, titanium carbide targets are widely used in aerospace, electronics, optical coatings, tritium-resistant coatings in fusion reactors, and coatings for tunneling machine cutter heads. In these fields, titanium carbide targets, with their excellent properties, provide strong support for enhancing equipment performance and reliability.

In summary, titanium carbide (TiC) target material, as a high-performance magnetron sputtering target material, exhibits unique advantages in terms of physical properties and industrial applications. With the continuous development and progress of technology, the application fields of titanium carbide targets will continue to expand and deepen, making greater contributions to the development of materials science and engineering.

 

TiN (Titanium Nitride) Target Material
TiN (Titanium Nitride) target material, as a high-performance magnetron sputtering target material, plays a pivotal role in the field of materials science and technology. Its unique physical properties and wide range of applications make it an indispensable key material in numerous high-tech industries. Below is a detailed introduction to TiN target material, including its basic overview, physical properties, and advantages in industrial applications. Our company focuses on technology research and development as well as production, striving to create industry-leading products. Our company produces the following nitride target materials:

Nitrides
Aluminum Nitride, AlN
Titanium Nitride, TiN
Boron Nitride, BN
Vanadium Nitride, VN
Niobium Nitride, NbN
Zirconium Nitride, ZrN
Silicon Nitride, Si3N4
Si3N4/TiN
Tantalum Nitride, TaN

Basic Overview
TiN (Titanium Nitride) target material is an inorganic compound composed of titanium (Ti) and nitrogen (N) elements, with the chemical formula TiN. This material typically exists in the form of gray or golden-yellow powder, particles, or blocks, exhibiting high hardness, high melting point, excellent electrical conductivity, and corrosion resistance. The preparation of TiN target material involves various methods, including powder metallurgy, chemical vapor deposition (CVD), and physical vapor deposition (PVD). Among these, magnetron sputtering technology is widely used due to its efficient, uniform, and controllable coating quality.

Physical Properties

Purity: TiN target material typically has a purity of 99.99% or higher. High-purity target materials ensure the quality and performance of the coatings. High-purity TiN targets reduce impurities and defects, enhancing the density and uniformity of the coatings.

Density: The density of TiN is approximately 5.22-5.44 g/cm³. This density values it excellent mechanical properties and wear resistance. During magnetron sputtering, high-density target materials can more effectively transfer energy, forming thicker and denser coating layers.

Melting Point: The melting point of TiN is as high as 2930-2950℃. This high melting point characteristic allows it to maintain its physical and chemical stability in high-temperature environments. This property gives TiN targets a significant advantage in applications where high temperatures need to be withstood.

Hardness: TiN has an extremely high hardness, with a Mohs hardness of 8-9, approaching that of diamond. This high hardnesss TiN targets excellent wear resistance and scratch resistance, making it an ideal surface coating material.

Chemical Composition: TiN is composed of titanium and nitrogen elements, with titanium and nitrogen atoms tightly bound together through ionic and covalent bonds, forming a stable crystal structure. This structures TiN targets excellent chemical stability and corrosion resistance.

Industry Application Advantages

Electronics Industry: TiN target materials have wide applications in the electronics industry, such as in the manufacturing of transistors, magnetic heads, integrated circuits, and other electronic devices. Its excellent electrical conductivity and wear resistance make TiN a key material for improving the performance and reliability of electronic devices.

Energy Sector: In the energy sector, TiN target materials, as additives for battery materials, can significantly enhance the performance and cycle life of batteries. Its high stability and good electrical conductivity make TiN an indispensable part of battery materials.

Surface Coatings: TiN target materials are widely used in the field of surface coatings, such as for preparing high-hardness and high-wear-resistance surface coatings to protect mechanical parts and tools from wear and corrosion. These coatings can significantly extend the service life and improve the performance of parts and tools.

Optics Field: TiN target materials have excellent optical properties and can be used as optical coating materials for mirrors, solar cells, and other optical devices. Its high reflectivity and low absorptivity make TiN a key material for improving the performance and efficiency of optical devices.

Medical Applications: In the medical field, TiN target materials have antibacterial properties and can be used to prepare medical materials and antibacterial coatings. Its excellent biocompatibility and corrosion resistance make TiN an ideal material in the medical field for manufacturing surgical instruments, implants, and other medical devices.

In summary, TiN (Titanium Nitride) target material plays a significant role in the field of materials science and technology due to its unique physical properties and wide range of applications. With the continuous advancement of technology and the expanding application fields, the prospects for the application of TiN target materials will become even broader.