High-purity Metal Cr Target for Magnetron Sputtering PVD Vacuum Coating, Customizable Particle Size, 99.99% Purity, Research and Experiment Material, with Backing Plate Bonding Service

Chromium target, as a target material made from chromium (Cr) element, plays a crucial role in physical evaporation and sputtering processes. Its unique physical and chemical properties, such as high melting point, good electrical conductivity, and corrosion resistance, make it an ideal choice in the field of thin film deposition. This article provides a detailed introduction to the basic characteristics, purity, density, melting point, chemical composition, and other physical properties of chromium targets, and discusses their application advantages in various industries. Our company specializes in research and development as well as production, creating industry-leading products. We produce single-element targets and electron beam evaporation particle materials as follows:

SINGLE ELEMENTS - Single-material Targets, Electron Beam Evaporation Particles
Aluminum (Al) | Nickel (Ni)
Antimony (Sb) | Niobium (Nb)
Arsenic (As) | Osmium (Os)
Barium (Ba) | Palladium (Pd)
Beryllium (Be) | Platinum (Pt)
Boron (B) | Rhenium (Re)
Cadmium (Cd) | Rhodium (Rh)
Carbon (C) | Rubidium (Rb)
Chromium (Cr) | Ruthenium (Ru)
Cobalt (Co) | Selenium (Se)
Copper (Cu) | Silicon (Si)
Gallium (Ga) | Silver (Ag)
Germanium (Ge) | Tantalum (Ta)
Gold (Au) | Tellurium (Te)
Hafnium (Hf) | Tin (Sn)
Indium (In) | Titanium (Ti)
Iridium (Ir) | Tungsten (W)
Iron (Fe) | Vanadium (V)
Lead (Pb) | Yttrium (Y)
Magnesium (Mg) | Zinc (Zn)
Manganese (Mn) | Zirconium (Zr)
Molybdenum (Mo)

Basic Introduction
Chromium target is a steel-gray, lustrous, hard, and brittle transition metal. In a vacuum, chromium target can produce a relatively stable beam of chromium ions, making it suitable for creating substrates or surface coatings to protect the base material or manufacture industrial parts that require high oxidation resistance. Chromium targets come in various shapes, including planar targets and custom-shaped targets, to meet the needs of different applications. Their purity can typically reach 2N5, 3N, or even 3N5, ensuring high-purity thin film deposition.

 

Physical Properties
Purity: The purity of a chromium target is a key indicator of its quality. High purity means fewer impurities, which can improve the electrical conductivity and optical properties of the thin film. Typically, the purity of chromium targets can reach 99.95% or higher, ensuring high quality and stability of thin film deposition.
Density: Density refers to the ratio of the mass of the chromium target to its volume. Chromium targets with densities close to the theoretical density can ensure higher sputtering efficiency and film uniformity. Ideal chromium targets should be close to or reach the theoretical density of chromium (approximately 7.19 g/cm³) to ensure optimal sputtering results.
Melting Point: Chromium has a high melting point of 1907°C, which makes chromium targets exhibit excellent stability and durability in high-temperature environments. They are particularly suitable for material preparation processes that require high-temperature processing, such as thin film deposition in semiconductor manufacturing.
Other Physical Properties: Chromium targets also have good thermal conductivity and significant hardness, which allow them to remain stable in high-temperature and high-pressure environments. In addition, the grain size of chromium targets is usually in the micrometer range, and fine grains help form smooth and uniform thin films, which have a significant impact on improving the mechanical properties and corrosion resistance of the thin films.

 

 

Chemical Composition and Chemical Properties
The main component of a chromium target is chromium (Cr), typically with a content of over 95%. Chromium is a silver-gray metallic element with good corrosion resistance and wear resistance. During the coating process, chromium provides good electrical conductivity and high reflectivity. In addition to chromium, chromium targets may contain trace amounts of other elements such as nickel (Ni), copper (Cu), and titanium (Ti), which can further improve the performance of the target.
Chromium targets have good oxidation resistance and corrosion resistance, and can form a stable oxide film on the surface in a natural environment to protect the metal from further corrosion. This characteristic makes chromium targets an ideal choice for manufacturing protective coatings and thin film materials used in corrosive environments.

 

 

Industry Application Advantages
Semiconductor Manufacturing: In semiconductor manufacturing, chromium targets are widely used for depositing thin films to create conductive paths and connections for microelectronic devices. By optimizing the electrical conductivity and stability of the circuits, the overall performance of semiconductor devices is significantly improved. Furthermore, the high heat resistance and excellent chemical stability of chromium thin films greatly enhance the reliability and durability of semiconductor products.
Solar Panel Manufacturing: In the production of solar panels, chromium targets improve the light absorption rate of the cells and reduce surface reflectivity, thereby enhancing solar conversion efficiency. This is significant for increasing the power generation of solar panels and reducing energy costs.
Automotive Industry: Chromium targets are also widely used in the automotive industry. They are excellent materials for forming shiny coatings on wheels and bumpers. In addition, chromium targets can be used for coating treatment of automotive glass, providing additional corrosion protection and enhancing the durability of the products.
Other Industrial Applications: Chromium targets are also widely used in the physical deposition of thin films and functional coating preparation for electronic components, displays, tools, etc. They also play an important role in the manufacturing of photovoltaic cells, batteries, as well as in the chemical, shipbuilding, aviation, and nuclear reactor industries.

 

In summary, as a high-performance magnetron sputtering target material, chromium target has an irreplaceable position in the field of thin film deposition due to its unique physical and chemical properties and wide range of application advantages. With the continuous development of technology, the application fields of chromium targets will continue to expand, providing more high-quality and efficient solutions for various industries.

 

Hf Hafnium Target, a High-end and Precision Magnetron Sputtering Target

I. Hf Hafnium Target, as a high-end and precision magnetron sputtering target, occupies a pivotal position in modern scientific research, higher education laboratories, and industrial coating technologies. Its unique material properties—high purity, excellent physical performance, and outstanding chemical stability—collectively form the foundation for the widespread application of Hf targets in multiple fields. Our company specializes in research and development as well as production, creating industry masterpieces.

II. Analysis of Material Properties

 

High Purity: The purity of Hf hafnium target is its core value. High-quality Hf targets on the market often reach a purity standard of 99.95% or even higher, meaning that almost all impurity elements are removed during the preparation process, thereby ensuring the purity of the Hf ion beam generated during the sputtering process. High purity not only improves the uniformity and consistency of the coating or thin film, but also reduces performance degradation or defects caused by impurities, providing reliable support for scientific research and industrial applications.

 

 

Good Physical Properties: As a transition metal, Hf hafnium has a moderate density and a high melting point (approximately 2233°C). The moderate density allows the Hf target to maintain a stable sputtering rate and efficiency during the sputtering process, while the high melting point ensures the stability and durability of the target in high-temperature environments. These physical properties together endow the Hf target with the ability to work under extreme conditions, meeting the demands of high-precision and high-stability coating processes.

 

 

Chemical Stability: Hf hafnium target exhibits good stability in various chemical environments and is not easily reactive with common gases or solutions. This chemical stability allows the Hf target to maintain its original physical and chemical properties during the coating process, avoiding performance changes or contamination issues caused by chemical reactions.

 

III. Industry Application Advantages

 

Scientific Research and University Laboratories: In scientific research and university laboratories, Hf targets are ideal for preparing high-quality thin films, nanomaterials, and modifying material surfaces due to their high purity and excellent performance. Researchers can use Hf targets for various basic research and application development, exploring new materials, technologies, and processes, and driving technological progress and industrial upgrading.

 

 

Industrial Coating: In the field of industrial coating, Hf targets are widely and deeply applied. Whether it's gate materials in semiconductor manufacturing, reflective films in optical devices, or electrode materials in solar cells, Hf targets can provide excellent performance guarantees for products with their high precision and stability. Especially in coating processes requiring high purity, high uniformity, and high adhesion, Hf targets are indispensable key materials.

 

 

Customized Services: With the diversification and personalization of market demands, Hf target suppliers have started to provide more flexible and customized services. Hf targets of different specifications, purities, and processing methods have emerged to meet the specific needs of different customers in different application scenarios. This customized service not only enhances the market competitiveness of Hf targets but also promotes their application and development in a wider range of fields.

 

In summary, Hf hafnium targets demonstrate enormous application potential and value in scientific research, university laboratories, and industrial coating fields due to their high purity, good physical properties, and chemical stability. With the continuous advancement of technology and the sustained growth of market demand, Hf targets will surely play a more important role in future development, contributing more to technological progress and industrial development.