Indium Tin Oxide Target Magnetron Sputtering Target

Indium Tin Oxide Target Magnetron Sputtering Target
Model:-
Brand:-
Origin:Made In China
Category:Metallurgy , Mining & Energy / Metallurgy & Mining / Metallic Powder
Label:ITO Target , Magnetron Sputtering , Target Material
Price: ¥140 / pc
Min. Order:1 pc

Product Description

ITO Target Material

ITO is an N-type oxide semiconductor - indium tin oxide. An ITO thin film, or indium tin oxide semiconductor transparent conductive film, typically has two performance indicators: resistivity and transmittance.

Among oxide conductive films, ITO (indium oxide doped with tin) films exhibit the highest transmittance and best electrical conductivity, and they can be easily etched into fine patterns in acid solutions. The transmittance can reach over 90%. In ITO, the transmittance and resistance are controlled by the ratio of In2O3 to SnO2, with a typical ratio of SnO2:In2O3 = 1:9. ITO is commonly used in touch panels, touch screens, and electroluminescent displays.

Indium tin metal oxide has excellent electrical conductivity and transparency, and can also block harmful electronic radiation, ultraviolet rays, and far-infrared rays to the human body. Therefore, when coated on glass, plastic, and electronic displays, it enhances conductivity and transparency while blocking harmful electronic radiation, ultraviolet, and infrared rays.

Electronics manufacturers traditionally use flat sputtering targets to manufacture flat panel displays, but only 30% of ITO is utilized in the production process, with the remaining target material being recycled. The utilization rate of rotary sputtering targets reaches 85%, meaning that once widely adopted, the amount of recyclable material will be significantly reduced.

ITO (indium tin oxide) is a representative transparent conductive thin film material and is one of the essential materials for manufacturing FPDs (flat panel displays) today. As a material that combines transparency and conductivity, it is widely used in FPD applications such as LCDs, PDPs, organic ELs, and touch panels, and is one of the indispensable materials. Additionally, it is also used in some thin-film solar cells and LEDs. ITO is commonly applied using the sputtering method in the form of a thin film. The basic properties of the film include a visible transmittance of over 90%, a resistivity of 0.2 mΩ-cm, and excellent durability. Over 90% of transparent conductive films for FPDs use ITO.

Key Performance Indicators of ITO Target Material

Ratio: In2O3/SnO2 90/10%, customizable according to user requirements
Density: ≥ 7.14 g/cm3 (theoretical density 7.15 g/cm)
Relative Density: ≥ 98.5%
Purity: 99.99%
Target Thickness: 2-100 mm
Target Utilization Rate: ≥ 82%
Substrate Collection Efficiency: 60%
Power Consumption: 7-12 KW/m

Payment Terms:TT
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Member Information

Suzhou Zhongzhina Semiconductor Technology Co., Ltd.
Country/Region:Jiang Su - China
Business Nature:Manufacturer
Phone:95613164
Contact:spring (Jiangsu Province)
Last Online:17 Feb, 2025