ITO靶材/粉體 ITO target/Powder

產品說明Product description

ITO靶材是銦錫氧化物功能陶瓷材料，主要用於磁控濺射靶材制備ITO導電薄膜。採用先進的常壓燒結工藝，多個靶管/靶塊拼接貼合為ITO靶材成品。

ITO target is a functional indium tin oxide ceramic material, which is used for deposition of ITO transparent conductive thin films with magnetron sputtering. It is produced by using the classic ceramic process at ambient pressure, in the form of tube/planar segments that are bonded into ITO target.

 

ITO旋轉靶/平面靶Rotary /Planar ITO target

組分Chemical composition (wt%)	In2O3:SnO2 = 90:10
純度 Purity (%)	≥99.99
密度 Density (g/cm3)	≥7.13
相對密度 Relative density (%)	≥99.5
電阻率 Electrical resistivity (Ω∙cm)	≤1.2×10-4

 

應用領域Applications

 

-導電玻璃Conductive glasses

-TFT-LCD, OLED, 觸摸屏Touch panel screens

-太陽能電池Solar cells

 

ITO 粉體/低密度靶 ITO powder/low density target

 

應用領域Applications

 

-蒸鍍制備透明導電薄膜 Vapor deposition of transparent and conductive thin films

-防紫外，防輻射塗料 Anti-UV, anti-radiation coatings

 

產品特點Product features:

-採用專業技術生產的ITO粉體，燒結密度高，微結構均勻。

ITO powder is self-produced using our own patent technology, with high sintered density and homogeneous microstructure.

-具有導電導熱性好，強度高等優點，減少結瘤現象和微電弧的出現。

High electrical and thermal conductivities, excellent mechanical property to minimize the formation of noddles and micro arc.

 

靶材尺寸Dimension

 

-旋轉靶每節長度(Length of segment): 200-300 mm

-平面靶單節規格(Dimension of planar segment) 400×400 mm2

-按圖紙要求加工(According to customized drawings)